Block Copolymer Composition for Finer Vertical Microphase Patterns
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Solution Overview
Problem
Current techniques for forming microphase-separated structures using block copolymers in semiconductor device manufacturing struggle to achieve finer structures perpendicular to the substrate.
Innovation Solution
A self-assembly film-forming composition comprising a block copolymer with a silicon-free polymer and a silicon-containing polymer, where the silicon-containing polymer has a styrene structural unit substituted with a silicon-containing group, is applied to a substrate, followed by phase separation to form a perpendicular microphase-separated pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional block copolymer techniques are used, then microphase-separated structures can be formed, but the structure fineness perpendicular to the substrate is insufficient
Solution Approach 1:
The patent modifies the chemical composition parameters of the block copolymer by incorporating silicon-containing groups (such as trimethylsilyl or phenylsilyl groups) into the polymer structure. This parameter change in molecular composition alters the phase separation behavior and interfacial properties, enabling finer microphase-separated structures perpendicular to the substrate while maintaining processability through conventional fabrication methods
Solution Approach 2:
The patent creates a composite block copolymer system combining silicon-containing polymer segments with non-silicon-containing polymer segments. This composite structure leverages the unique properties of silicon groups (such as steric bulk and electronic effects) to enhance phase separation characteristics and achieve finer vertical structures, while the overall system remains processable using standard manufacturing techniques
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively forms a finer microphase-separated structure perpendicular to the substrate, enabling improved semiconductor device manufacturing processes.
Implementation Method 1
the block copolymer in the self-assembly film is then separated into phases, and a phase of at least one of the polymers constituting the block copolymer is selectively removed to form a pattern
Implementation Method 2
attempts have been made in which finer patterns are formed by utilizing a phase-separated structure that is organized by the self-assembly of a block copolymer
Data Source
AI summary
A self-assembled film forming composition for forming a phase-separated structure of a block copolymer layer on a substrate, containing a block copolymer and a solvent, and is configured such that: the block copolymer is obtained by bonding a silicon-free polymer to a silicon-containing polymer that contains, as a constituent unit, styrene that is substituted by a silicon-containing group; the silicon-free polymer contains a structure derived from formula [1-1] or formula [1-2]; and the silicon-containing group contains one silicon atom. [In formula [1-1] or formula [1-2], each of R1 and R2 independently represents a hydrogen atom, a halogen atom or an alkyl group having 1-10 carbon atoms; and each of R3-R5 independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1-10 carbon atoms, an alkoxy group having 1-10 carbon atoms, a cyano group, an amino group, an amide group or a carbonyl group.]