High-Molecular-Weight Block Copolymers via PISA Self-Assembly

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Solution Overview

Problem

Existing block copolymers used in personal care and other industrial applications lack the unique performance attributes required for efficient self-assembly and high molecular weight, limiting their effectiveness in various compositions.

Innovation Solution

Development of high molecular weight block copolymers comprising repeating units derived from monomers with lactam and acryloyl moieties and hydrophilic monomers, synthesized using polymerization-induced self-assembly (PISA) techniques, enabling direct nanoparticle formation without post-polymerization processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If traditional copolymer preparation methods are used, then copolymer chains can be prepared in non-selective solvents, but post-polymerization processing steps are required to achieve self-assembly

Engineering Contradiction:
Improveease of self-assembly processingVSAvoidprocessing time
Core Design Contradiction:
Ease of manufactureVSLoss of time

Solution Approach 1:

The patent combines polymerization and self-assembly into a single integrated process called polymerization-induced self-assembly (PISA). The block copolymers self-assemble directly during the polymerization reaction in selective solvents, eliminating the need for separate post-polymerization processing steps. This merging of synthesis and self-assembly achieves both time efficiency and ease of manufacture.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent employs preliminary action by conducting self-assembly during the polymerization process itself rather than afterward. The block copolymers begin self-assembling as they are being synthesized, with the morphology developing concurrently with polymer chain formation. This preliminary self-assembly eliminates subsequent processing steps and reduces overall manufacturing time.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If conventional polymerization methods are used, then multiple processing steps are required, but PISA enables direct nanoparticle formation

Engineering Contradiction:
Improvesynthesis efficiencyVSAvoidprocessing complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent merges polymerization synthesis and nanoparticle formation into a single PISA process. Block copolymers are synthesized in selective solvents and self-assemble into nanoparticles concurrently during the reaction. This integration dramatically improves productivity by eliminating multiple sequential steps while reducing processing complexity through a unified reaction system.

Inventive Principle:
Principle #5Merging (Combining)

3Reliability

If block copolymers are prepared in dilute solution, then self-assembly can occur, but high molecular weight and enhanced performance are limited

Engineering Contradiction:
Improveperformance reliabilityVSAvoidmolecular weight
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The patent applies parameter changes by conducting PISA in concentrated selective solvent systems rather than dilute solutions. This parameter change enables the formation of high molecular weight block copolymers that self-assemble into nanoparticles with enhanced performance and stability. The concentrated conditions promote better chain entanglement and more robust nanoparticle structures.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The high molecular weight block copolymers exhibit enhanced performance in personal care compositions and other industrial applications, such as improved stability and functionality in colloidal particles, coatings, and oilfield fluids.

Implementation Method 1

AB type of diblock copolymers undergo self-assembly both in the solid state and also in solution

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Implementation Method 2

polymerization-induced self-assembly (PISA) of diblock copolymers in a solvent that is selective for the growing second block

Methodology Applied
Scientific EffectPolymerization-induced self-assembly (PISA):

Data Source

PatentUS12497478B2High molecular weight block copolymers comprising repeating units derived from monomers comprising lactam and acryloyl moieties and hydrophilic monomers, compositions, and applications thereof
Publication Date: 2025.12.16 ISP INVESTMENTS LLC
  • US12497478B2 patent drawing
  • US12497478B2 patent drawing
  • US12497478B2 patent drawing

AI summary

This application provides high molecular weight block copolymers comprising at least one block A comprising repeating units derived from monomers comprising lactam and acryloyl moieties and at least one block B comprising repeating units derived from hydrophilic monomers. The application further provides compositions comprising the block copolymers and applications thereof in various industrial areas including personal care. The application furthermore provides compositions comprising colloidal particles of the block copolymers. The variables x, y, R8 and R9 are described herein (I). Wherein each x and y is independently an integer having a value from about 10 to about 10000, and each R8, and R9 is independently selected from the group consisting of hydrogen, methyl, and combinations thereof.