Blocking Layer Composition for Lithography Pattern Fidelity

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Solution Overview

Problem

The semiconductor industry faces challenges in maintaining pattern fidelity and process windows during lithography processes due to intermixing of organic layers with other material layers, particularly in advanced lithography techniques like DUV and EUV, where traditional methods struggle with removing hardened organic materials and substrate damage.

Innovation Solution

A blocking layer composed of specific polymer materials, such as polyacrylamides and polyamines, is used to isolate the organic layer from other layers, preventing intermixing and allowing for effective solvent stripping without cross-linking, thereby maintaining high pattern fidelity and improving process windows.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional lithography methods are used, then manufacturing simplicity is maintained, but intermixing between organic layers and other material layers occurs, reducing manufacturing precision

Engineering Contradiction:

Improvepattern fidelityVSAvoidprocess complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

A blocking layer is introduced as an intermediary between the organic layer and the middle layer. This blocking layer prevents direct contact and intermixing between the organic layer and solvents from the middle layer, thereby maintaining pattern fidelity and manufacturing precision without significantly complicating the overall process

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The lithography process is segmented into distinct layers with specific functions: the organic layer for pattern formation, the blocking layer for isolation and protection, and the middle layer for additional patterning. This segmentation allows each layer to perform its function independently, preventing intermixing while maintaining process manageability

Inventive Principle:

Principle #1Segmentation

2Stability of the object's composition

If cross-linking is used to harden organic materials, then layer stability is improved, but removal of organic materials becomes difficult, worsening ease of manufacture

Engineering Contradiction:

Improvelayer stabilityVSAvoidorganic material removal

Core Design Contradiction:

Stability of the object's compositionVSEase of manufacture

Solution Approach 1:

The blocking layer is applied preliminarily before the organic layer is cross-linked and hardened. This blocking layer provides a protective barrier that prevents solvents from penetrating into the organic layer during subsequent processing, allowing the organic layer to be easily removed later without cross-linking, thus maintaining ease of manufacture while ensuring layer stability

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The blocking layer serves as a temporary, disposable protective layer that is removed after serving its isolation function. This allows the organic layer to remain uncross-linked and easily removable, while the blocking layer itself is discarded after use, simplifying the overall manufacturing process

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

3Productivity

If geometry sizes are decreased, then production efficiency is improved, but intermixing impact increases, reducing manufacturing precision

Engineering Contradiction:

Improveproduction efficiencyVSAvoidcritical dimension control

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The blocking layer acts as a protective intermediary that becomes increasingly important as geometry sizes decrease. By preventing solvent penetration and intermixing, it maintains sharp interfaces and precise critical dimensions, enabling continued scaling while preserving manufacturing precision

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The blocking layer effectively prevents intermixing, enhances imaging resolution, and facilitates complete removal of organic materials, improving the overall efficiency and accuracy of semiconductor manufacturing processes.

Implementation Method 1

a blocking layer composed of specific polymer materials, such as polyacrylamides and polyamines, is used to isolate the organic layer from other layers, preventing intermixing

Methodology Applied

Scientific EffectPhysical isolation:

Implementation Method 2

an organic layer used as an under layer in a lithography process may have compositions (e.g., monomers or polymers) dissolved in solvents from another layer coated above it

Methodology Applied

Scientific EffectSolvation: Solvation

Data Source

PatentUS10747114B2Blocking layer material composition and methods thereof in semiconductor manufacturing

Publication Date: 2020.08.18 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a material layer on a substrate; forming a blocking layer on the material layer, wherein a bottom portion of the blocking layer reacts with the material layer, resulting in a capping layer that seals the material layer from an upper portion of the blocking layer. The method further includes forming a photoresist layer on the blocking layer; exposing the photoresist layer; and developing the photoresist layer, resulting in a patterned photoresist layer.