Semiconductor Chip Bonding Electrodes With Fine Grain and Nanotwin Copper

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Solution Overview

Problem

Semiconductor chip structures with poor bonding reliability during manufacturing can lead to improper performance, as seen in existing bonding methods for first and second semiconductor chips.

Innovation Solution

A semiconductor chip structure design that includes hybrid-bonding of first and second semiconductor chips using a bonding interface comprising fine grain copper and nanotwin copper, with planar bonding surfaces to enhance bonding reliability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional bonding methods are used to bond semiconductor chips, then the manufacturing process is simple, but the bonding reliability is insufficient

Engineering Contradiction:
Improvebonding reliabilityVSAvoidbonding structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The bonding electrode uses a composite structure combining fine grain copper (grain size 1 μm or less) and nanotwin copper, creating a multi-phase material system that leverages the high ductility of fine grain copper and the high strength of nanotwin copper to achieve superior bonding reliability

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The bonding electrode exhibits non-uniform microstructure with different regions having different properties: fine grain copper is distributed in specific areas to provide ductility and bonding capability, while nanotwin copper forms in other regions to provide strength, creating local quality variations that optimize both bonding reliability and mechanical properties

Inventive Principle:
Principle #3Local quality

2Reliability

If hybrid bonding technique with fine grain copper and nanotwin copper is used, then bonding reliability is enhanced, but the manufacturing complexity increases

Engineering Contradiction:
Improvebonding reliabilityVSAvoidmanufacturing ease
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The manufacturing process controls copper grain structure by changing physical parameters during fabrication, specifically controlling grain size to 1 μm or less and creating nanotwin structures through controlled processing conditions, thereby achieving the desired microstructure through parameter optimization rather than complex additional steps

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The hybrid-bonding approach increases the bonding reliability between semiconductor chips, ensuring proper functionality by maximizing interdiffusion of copper at the bonding interface.

Implementation Method 1

The first bonding insulation layer and the first bonding electrode of the first bonding wiring layer are respectively hybrid-bonded to the second bonding insulation layer and the second bonding electrode of the second bonding wiring layer

Methodology Applied
Scientific EffectHybrid bonding:

Data Source

PatentEP4503106B1Semiconductor chip structure
Publication Date: 2026.05.06 SAMSUNG ELECTRONICS CO LTD
  • EP4503106B1 patent drawingFigure 1
  • EP4503106B1 patent drawingFigure 2
  • EP4503106B1 patent drawingFigure 3A

AI summary

A semiconductor chip structure includes a plurality of semiconductor chips. A bonding electrode included in each of the semiconductor chips is filled with nanotwin copper and fine grain copper is disposed in at least a portion of the bonding electrode.