Bonding Pad Test Structure for Detecting CMP Galvanic Corrosion
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Solution Overview
Problem
The CMP process for bonding pad metal in semiconductor devices is prone to galvanic corrosion, which is difficult to detect using in-line defect tools, posing a risk to the integrity of electrical connections.
Innovation Solution
A bonding failure test method is developed to identify defects, galvanic corrosion, and non-bond issues by probing test pad sets and analyzing return signals through specific connection traces, allowing for precise detection of failure modes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If CMP process is used for bonding pad metal, then planarization is achieved, but galvanic corrosion occurs which is difficult to detect
Solution Approach 1:
The patent applies preliminary action by designing a test structure with a test pad and connection trace before the actual bonding process. This test structure allows detection of galvanic corrosion and bonding failures in advance, enabling preventive measures to be taken before the corrosion affects the actual electrical connections. The test pad is specifically designed with a larger area than the bonding pad to enhance sensitivity to galvanic corrosion effects.
Solution Approach 2:
The patent uses an intermediary approach by introducing a test pad as a mediator between the CMP process and the actual bonding pad. The test pad serves as a sacrificial element that undergoes the same CMP process and is exposed to the same galvanic corrosion risks, but its primary function is to provide detectable signals about the corrosion status without compromising the critical electrical connections.
2Productivity
If in-line defect tool is used for detection, then manufacturing efficiency is maintained, but galvanic corrosion cannot be detected
Solution Approach 1:
The patent applies segmentation by separating the detection function from the manufacturing process. Instead of relying on a single in-line defect tool, the patent divides the detection capability into a dedicated test structure (test pad and connection trace) that can be probed separately. This segmentation allows the use of simple, fast probing methods that maintain manufacturing efficiency while achieving the precise detection capability needed for galvanic corrosion.
Solution Approach 2:
The patent replaces complex mechanical inspection systems with a simpler electrical probing method. Instead of using sophisticated in-line defect tools with complex optical or mechanical scanning systems, the patent substitutes an electrical probe that measures resistance or continuity between the test pad and bonding pad. This substitution maintains high productivity while achieving precise detection of galvanic corrosion through electrical property changes.
3Measurement precision
If test pad area is larger than bonding pad area, then detection sensitivity is improved, but device complexity increases
Solution Approach 1:
The patent applies universality by designing the test pad to serve multiple functions: it acts as a bonding target during the bonding process, serves as a probe target for detection, and provides a reference for measuring galvanic corrosion. This multi-functionality allows the test structure to achieve high detection sensitivity without adding separate dedicated test elements, thereby avoiding increased device complexity.
Data Source
AI summary
A semiconductor device includes a bottom die and a top die. The includes a first test pad set, a second test pad set, a first bottom BPM set electrically connected with the first test pad set, and a second bottom BPM set electrically connected with the second test pad set. The top die includes a first top BPM set bonding to the first bottom BPM set, and a second top BPM set bonding to the second bottom BPM set. The first test pad set has a test pad area, the first bottom BPM set has a first bottom BPM area, and the second bottom BPM set has a second bottom BPM area. The test pad area is greater than the first bottom BPM area and the second bottom BPM area, and the first bottom BPM area is equal to or less than the second bottom BPM area.


