Water Vapor Plasma Cleaning for Boron-Carbon Residuals

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Solution Overview

Problem

Conventional cleaning methods for processing chambers with high-temperature boron-carbon hardmask layers react with aluminum components, leading to contamination and process drift, as fluorine or chlorine-containing gases etch aluminum components, forming harmful compounds that redeposit and contaminate the chamber.

Innovation Solution

A method involving a plasma process with water vapor and specific carrier gases, including a first plasma process with a showerhead bias and a second plasma process with a side electrode bias, effectively removes boron-carbon layers from chamber components without reacting with aluminum, using a water vapor plasma to oxidize and etch the boron-carbon layers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If fluorine-rich or chlorine-rich gases are used for chamber cleaning, then boron-carbon layers are removed effectively, but aluminum components are etched and contamination is generated

Engineering Contradiction:

Improvecleaning efficiencyVSAvoidaluminum component etching and contamination

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the chemical composition parameters of the cleaning gas from fluorine-rich or chlorine-rich gases to oxygen-rich plasma. This parameter change allows effective removal of boron-carbon layers through oxidation while avoiding the etching of aluminum components that occurs with conventional cleaning gases.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent employs oxygen-rich plasma as a strong oxidizing environment to remove boron-carbon deposition residuals. The oxygen plasma oxidizes the boron-carbon layers, converting them to volatile compounds that can be evacuated, achieving effective cleaning without damaging aluminum chamber components.

Inventive Principle:

Principle #38Strong oxidants (Accelerated oxidation)

2Productivity

If high temperature (T>400°C) is used during cleaning, then boron-carbon layers are more easily removed, but aluminum fluoride formation and redeposition increase

Engineering Contradiction:

Improveboron-carbon layer removal rateVSAvoidaluminum fluoride redeposition and contamination

Core Design Contradiction:

ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent changes the chemical environment parameter from fluorine-rich to oxygen-rich plasma. This prevents the formation of aluminum fluoride even at elevated temperatures, eliminating the redeposition problem while maintaining effective boron-carbon layer removal through oxidation.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent converts the high temperature condition, which normally causes aluminum fluoride formation and redeposition, into a beneficial state by using oxygen-rich plasma. The high temperature enhances the oxidation of boron-carbon layers while the oxygen environment prevents harmful aluminum fluoride formation, turning a previously harmful condition into a useful one.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method selectively removes boron-carbon layers from chamber components, preventing contamination and maintaining chamber cleanliness, while avoiding the formation of harmful compounds that can redeposit and affect subsequent processes.

Implementation Method 1

The first plasma process comprises positioning a pedestal at a first distance from the showerhead and generating a plasma that comprises water vapor and a first carrier gas by biasing a showerhead

Methodology Applied

Scientific EffectPlasma: Plasma

Implementation Method 2

using a water vapor plasma to oxidize and etch the boron-carbon layers

Methodology Applied

Scientific EffectOxidation: Oxidation

Data Source

PatentUS10679830B2Cleaning process for removing boron-carbon residuals in processing chamber at high temperature

Publication Date: 2020.06.09 APPLIED MATERIALS INC

AI summary

Embodiments of the invention generally relate to methods for removing a boron-carbon layer from a surface of a processing chamber using water vapor plasma treatment. In one embodiment, a method for cleaning a surface of a processing chamber includes positioning the pedestal at a first distance from the showerhead, and exposing a deposited boron-carbon layer to a first plasma process where the first plasma process comprises generating a plasma that comprises water vapor and a first carrier gas by biasing a showerhead that is disposed over a pedestal, and positioning the pedestal at a second distance from the showerhead and exposing the deposited boron-carbon layer to a second plasma process where the second plasma process comprises generating a plasma that comprises water vapor and a second carrier gas by biasing the showerhead and biasing a side electrode relative to the showerhead.