Branch Exhaust Layout for Plasma Interference Suppression
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Solution Overview
Problem
Existing plasma processing devices experience plasma interference and inefficiencies due to hot electrons generating unintended plasma in multiple processing chambers sharing a common exhaust flow path, leading to reduced radio-frequency power efficiency and substrate processing variations.
Innovation Solution
The plasma processing device incorporates branch exhaust pipes with a spiral-shaped mechanism to deactivate hot electrons and introduces a plasma suppression gas into the junction exhaust pipe, preventing plasma generation in adjacent chambers and the junction exhaust pipe.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple processing chambers share a common exhaust flow path, then device complexity is reduced and productivity is improved, but plasma interference occurs between chambers due to hot electrons
Solution Approach 1:
A plasma suppression gas (intermediary substance) is introduced into the exhaust flow path to suppress plasma generation. The gas acts as a mediator that prevents hot electrons from generating unintended plasma in adjacent chambers while allowing the common exhaust flow path to function
Solution Approach 2:
An inert or non-reactive atmosphere is created in the exhaust flow path by introducing plasma suppression gas. This inert environment prevents plasma generation by hot electrons without interfering with the normal exhaust function, thereby eliminating plasma interference between chambers
2Device complexity
If a common exhaust flow path is used, then device complexity is reduced, but radio-frequency power efficiency decreases due to unintended plasma generation
Solution Approach 1:
The plasma suppression gas serves as an intermediary that selectively suppresses unintended plasma generation in the exhaust path while allowing the simple common exhaust configuration to remain. This maintains low device complexity while restoring radio-frequency power efficiency by preventing energy loss to parasitic plasma
Solution Approach 2:
The chemical composition parameter of the exhaust atmosphere is changed by introducing plasma suppression gas. This parameter change suppresses plasma generation threshold, preventing hot electrons from generating unintended plasma and thereby improving radio-frequency power efficiency without requiring complex exhaust system modifications
3Ease of operation
If processing chambers are connected via common exhaust, then ease of operation is improved, but substrate processing consistency deteriorates due to plasma variations
Solution Approach 1:
By creating an inert atmosphere in the exhaust path through plasma suppression gas, the system maintains the operational simplicity of a common exhaust configuration while eliminating plasma variations. This ensures consistent substrate processing across all chambers connected to the common exhaust
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents plasma interference, maintains radio-frequency power efficiency, and ensures consistent substrate processing by reducing unnecessary plasma generation, thereby improving processing consistency and reducing costs.
Implementation Method 1
each of the plurality of branch exhaust pipes includes a mechanism, which is disposed in a flow path of the branch exhaust pipe, to deactivate energy of hot electrons flowing through the flow path
Implementation Method 2
introduces a plasma suppression gas into the junction exhaust pipe, preventing plasma generation in adjacent chambers and the junction exhaust pipe
Data Source
AI summary
A plasma processing device includes: a plurality of processing chambers; a junction exhaust pipe into which a plurality of exhaust flow paths for evacuating interiors of the plurality of processing chambers joins; and a plurality of branch exhaust pipes disposed between the plurality of exhaust flow paths and the junction exhaust pipe and connecting the junction exhaust pipe to the plurality of exhaust flow paths, respectively, wherein each of the plurality of branch exhaust pipes includes a mechanism, which is disposed in a flow path of the branch exhaust pipe, to deactivate energy of hot electrons flowing through the flow path.