Branched Organopolysiloxane Composition for Alkali-Soluble Beam Curing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing high energy beam-curable polysiloxanes lack sufficient alkali solubility and curability, limiting their effectiveness in resist materials for electronic and electrical devices.
Innovation Solution
A co-modified branched organopolysiloxane with phenolic hydroxyl and carboxylic acid-containing organic groups, which exhibits high solubility in aqueous alkali solutions and excellent high energy beam curability, forming a curable composition with a cured product having mechanical strength and transparency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If phenol-functional polysiloxane is used as resist material, then etching resistance is improved, but alkali solubility deteriorates
Solution Approach 1:
The patent introduces specific functional groups (carboxylic acid, hydroxyl, amino) at particular positions within the polysiloxane molecular structure to achieve localized chemical properties that enable both etching resistance and alkali solubility. The co-modified branched structure places functional groups strategically to resolve the contradiction between these two properties.
Solution Approach 2:
The patent creates a composite molecular structure by combining multiple functional groups (phenolic hydroxyl, carboxylic acid, amino groups) within a single polysiloxane framework. This composite approach allows the material to simultaneously exhibit etching resistance from the phenolic groups and alkali solubility from the carboxylic acid and amino groups.
2Ease of manufacture
If linear polysiloxane structure is used, then processing is simplified, but alkali solubility deteriorates
Solution Approach 1:
The patent segments the polysiloxane structure into branched molecular architectures with multiple functional groups distributed throughout the structure. This segmentation approach maintains processing simplicity while enabling alkali solubility through the distributed functional groups that can interact with alkali solutions.
Solution Approach 2:
The patent introduces dynamic functional groups (carboxylic acid, hydroxyl, amino) that can change their chemical state in response to environmental conditions, particularly alkali exposure. These groups can protonate/deprotonate or undergo other transformations that enable solubility in alkali solutions while maintaining structural integrity during processing.
3Manufacturing precision
If high energy beam curability is enhanced, then patterning performance is improved, but material stability deteriorates
Solution Approach 1:
The patent modifies chemical parameters of the polysiloxane structure by introducing specific functional groups with different reactivity characteristics. The carboxylic acid, hydroxyl, and amino groups provide controlled reactivity for high energy beam curing while the branched structure and molecular weight distribution provide stability, achieving a balance between patterning performance and material stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The co-modified branched organopolysiloxane provides excellent alkali solubility and high energy beam curability, enabling effective patterning and insulating properties in electronic devices, with a cured film showing high solubility and mechanical strength.
Implementation Method 1
a co-modified branched organopolysiloxane which can be cured by actinic rays, for example high energy beams or electron beams
Implementation Method 2
The co-modified branched organopolysiloxane of the present invention has high solubility in aqueous alkali solutions
Data Source
AI summary
Provided is a curing-reactive organopolysiloxane having favorable alkali solubility and a high energy beam-curable composition containing the same. Specifically, provided is a co-modified branched organopolysiloxane expressed by the following average unit formula (1): (A3SiO1/2)a(A2SiO2/2)b(RSiO3/2)c(SiO4/2)d where R represents a monovalent hydrocarbon group or the like; A is selected from the same group as R, specific phenolic hydroxyl group-containing organic groups M1 and specific carboxylic acid-containing organic groups M2; at least one of A is M1 and at least one is M2; and a, b, c, and d satisfy the following conditions: 0≤a, 0≤b, 0<(a+b), and 0<(c+d); and a use thereof.