In-Chamber Brush Aging With Real-Time Protrusion Measurement

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Solution Overview

Problem

Existing brush aging processes are inefficient and inaccurate, leading to extended processing times and potential damage to wafers during the installation of new brushes in semiconductor manufacturing, due to the need for frequent movement of brushes between different regions for measurement and aging.

Innovation Solution

A brush aging apparatus and method that integrates a chamber with a sensor to measure brush parameters in real-time, allowing for precise control of aging processes, including the use of an aging bar and nozzle to adjust pressure and rotation speed based on measured parameters, ensuring the brush reaches target specifications before installation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the brush is moved between different regions for measurement and aging, then the measurement can be performed, but the process time is extended and the operation becomes complex

Engineering Contradiction:
Improvebrush parameter measurementVSAvoidprocess time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent combines the measurement function and aging function into a single integrated chamber. The sensor is positioned within the aging chamber to directly measure brush parameters while the brush remains in place during the aging process, eliminating the need to move the brush between separate measurement and aging regions. This merging of functions reduces process time while maintaining measurement precision.

Inventive Principle:
Principle #5Merging (Combining)

2Measurement precision

If the brush is moved between different regions for measurement and aging, then the measurement can be performed, but the operation complexity increases

Engineering Contradiction:
Improvebrush parameter measurementVSAvoidoperation complexity
Core Design Contradiction:
Measurement precisionVSEase of operation

Solution Approach 1:

The patent integrates the measurement system within the aging chamber, allowing both measurement and aging operations to be performed in one location. The sensor is positioned to measure brush parameters directly while the brush undergoes aging, eliminating the need for complex movement and positioning operations between separate regions. This simplifies the overall operation while maintaining measurement accuracy.

Inventive Principle:
Principle #5Merging (Combining)

3Reliability

If the aging bar applies pressure to abrade the protrusions, then the aging effect is achieved, but the brush may damage the wafer if not properly controlled

Engineering Contradiction:
Improvebrush aging effectivenessVSAvoidwafer damage risk
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent employs real-time feedback control where the sensor continuously measures brush parameters during the aging process. The measured data is fed back to the controller, which adjusts the aging bar's pressure and the brush rotation speed to maintain optimal aging conditions. This feedback mechanism ensures the brush is properly aged to prevent wafer damage while avoiding excessive abrasion that could harm the wafer.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent dynamically adjusts aging parameters including the aging bar pressure and brush rotation speed based on real-time measurements. By changing these parameters during the aging process, the system optimizes the aging effectiveness while preventing excessive wear that could lead to wafer damage, thus balancing reliability and harm prevention.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances aging accuracy and reduces process time by allowing continuous measurement and adjustment within the same chamber, preventing wafer damage and improving productivity and reliability of the aging process.

Implementation Method 1

a sensor spaced apart from the brush and configured to measure parameters of the plurality of protrusions

Methodology Applied
Scientific EffectSensor detection:

Implementation Method 2

an aging bar configured to abrade the plurality of protrusions

Methodology Applied
Scientific EffectAbrasion: Abrasion

Implementation Method 3

a nozzle configured to discharge a cleaning solution to an interface where the brush contacts the aging bar

Methodology Applied
Scientific EffectFluid spray cleaning: Fluid Spray

Data Source

PatentUS20250351951A1Brush aging apparatus and brush aging method
Publication Date: 2025.11.20 SAMSUNG ELECTRONICS CO LTD
  • US20250351951A1 patent drawing
  • US20250351951A1 patent drawing
  • US20250351951A1 patent drawing

AI summary

A brush aging apparatus may include: a chamber configured to provide a process space; and inside the process space: a brush including a plurality of protrusions protruding in a direction perpendicular to a circumferential surface of the brush; a stand detachably coupled to the brush and configured to rotate the brush by taking a lengthwise direction of the brush as a rotation axis; an aging bar configured to abrade the plurality of protrusions; a driving member coupled to the aging bar and configured to move the aging bar to make the aging bar contact or be spaced apart from at least any one of the plurality of protrusions of the brush; a nozzle configured to discharge a cleaning solution to an interface where the brush contacts the aging bar; and a sensor spaced apart from the brush and configured to measure parameters of the plurality of protrusions.