Brush Carousel Assembly for Post-CMP Substrate Cleaning

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Solution Overview

Problem

Traditional scrubber assemblies in post-CMP cleaning processes lack the ability to clean and condition brushes mid-cycle, leading to inefficient cleaning and cross-contamination between substrates due to incomplete brush cleaning.

Innovation Solution

A brush carousel assembly with a rotating carriage and multiple brush mounting assemblies, allowing for simultaneous cleaning and conditioning of brushes during the processing cycle without interrupting the cleaning process, using a configuration where one brush is in contact with the substrate while the other is positioned for cleaning or conditioning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional scrubber assemblies use one brush on each side of the substrate in constant contact, then the cleaning process is simple and continuous, but the brushes cannot be cleaned or conditioned mid-cycle leading to cross-contamination

Engineering Contradiction:
Improvecleaning efficacyVSAvoidcross-contamination
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The single brush assembly is segmented into multiple brush assemblies (first brush assembly, second brush assembly, third brush assembly) arranged in a carousel configuration. This allows one brush to contact the substrate while others are positioned for cleaning or conditioning, eliminating cross-contamination while maintaining continuous cleaning capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Brush assemblies are pre-positioned in different states: one in contact with substrate, others in cleaning or conditioning positions. This preliminary arrangement ensures that clean brushes are ready before substrate contact, preventing cross-contamination from previous substrates.

Inventive Principle:
Principle #10Preliminary action

2Object-generated harmful factors

If brushes are cleaned mid-cycle, then cross-contamination is reduced, but the cleaning process complexity increases

Engineering Contradiction:
Improvecross-contaminationVSAvoidbrush assembly structure
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The cleaning and conditioning functions are merged into the same carousel assembly that performs substrate cleaning. The brush assemblies serve dual purposes: cleaning substrates and being cleaned/conditioned themselves, reducing overall system complexity despite the mid-cycle cleaning capability.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The brush carousel assembly performs multiple functions simultaneously: cleaning substrate surfaces, cleaning brush assemblies, and conditioning brushes. This multi-functionality reduces the need for separate cleaning systems, offsetting the complexity increase with operational efficiency.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Productivity

If multiple brush assemblies are used in a carousel configuration, then continuous cleaning and conditioning is achieved, but the device complexity increases

Engineering Contradiction:
Improvecleaning efficiencyVSAvoidcarousel assembly structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The carousel assembly rotates to periodically bring different brush assemblies into contact with the substrate while others undergo cleaning or conditioning. This periodic action allows continuous substrate cleaning with multiple brushes in different operational states, improving productivity despite the complex carousel structure.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances cleaning efficacy by continuously cleaning and conditioning brushes, reducing cross-contamination between substrates and maintaining effective cleaning throughout the processing cycle.

Implementation Method 1

Post-CMP scrubbing brushes (i.e., scrubbers) remove particles by directly contacting the brush with the substrate surface

Methodology Applied
Scientific EffectMechanical abrasion: Abrasion

Implementation Method 2

a carriage configured to rotate or pivot about a carriage axis

Methodology Applied
Scientific EffectRotational motion:

Implementation Method 3

one or more rotatable support members configured to support the brush assembly and rotate about a corresponding brush axis

Methodology Applied
Scientific EffectRotational contact: Friction

Data Source

PatentUS12023779B2Post-chemical mechanical polishing brush cleaning box
Publication Date: 2024.07.02 APPLIED MATERIALS INC
  • US12023779B2 patent drawing
  • US12023779B2 patent drawing
  • US12023779B2 patent drawing

AI summary

Embodiments provided herein include a system and method for cleaning a first surface of a substrate using a brush carousel assembly. In one embodiment, the brush carousel assembly includes one or more rotatable brush mounting assemblies coupled to a rotatable carriage, having a carriage support structure configured to rotate about a carriage axis. The brush carousel assembly further includes a second brush mounting assembly disposed a second radial distance from the carriage axis, and coupled to the support structure of the carriage that includes the one or more rotatable support members.