Buffer Storage Substrate Exchange in Semiconductor Processing

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Solution Overview

Problem

The existing substrate processing apparatuses face inefficiencies in production due to the long time required for exchanging substrates between load lock chambers, which significantly impacts overall processing time and production efficiency.

Innovation Solution

The introduction of buffer storages between the processing chamber and load lock chambers allows for simultaneous preparation and processing of substrates, reducing the time needed for exchanging by enabling continuous operation and efficient transfer of substrates between holders and buffer storages.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are exchanged between load lock chambers using conventional sequential methods, then substrate transfer is completed, but the exchange time is excessively long and production efficiency is reduced

Engineering Contradiction:
Improveproduction efficiencyVSAvoidsubstrate exchange time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent introduces buffer storages that pre-store substrates in a ready state between the processing chamber and load lock chambers. This preliminary preparation allows substrates to be immediately available for transfer without waiting for sequential exchange operations, thereby reducing substrate exchange time and improving production efficiency

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The buffer storages act as intermediary components between the processing chamber and load lock chambers. These intermediaries enable parallel operations where substrates can be prepared in the buffer while other substrates are being processed, eliminating the sequential bottleneck and reducing overall exchange time

Inventive Principle:
Principle #24Intermediary (Mediator)

2Loss of time

If buffer storages are introduced between processing chamber and load lock chambers, then substrate exchange time is reduced and continuous operation is enabled, but device complexity increases

Engineering Contradiction:
Improvesubstrate exchange timeVSAvoidapparatus structure
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The patent segments the substrate transfer path by introducing separate buffer storages between the processing chamber and load lock chambers. This segmentation allows independent operation of each segment, enabling parallel substrate preparation and transfer operations that reduce exchange time while maintaining manageable system complexity through modular design

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS7695233B2Substrate processing apparatus
Publication Date: 2010.04.13 KLA CORP
  • US7695233B2 patent drawing
  • US7695233B2 patent drawing
  • US7695233B2 patent drawing

AI summary

The substrate processing apparatus is capable of highly efficiently feeding and carrying out work and improving production efficiency. The substrate processing apparatus comprises: a processing chamber including a processing stage; a first load lock chamber for feeding the work, the first load lock chamber being communicated to the processing chamber; a second load lock chamber for carrying out the work, the second load lock chamber being communicated to the processing chamber; a first buffer storage being located between the processing chamber and the first load lock chamber, the first buffer storage storing the work to be transferred therebetween; and a second buffer storage being located between the processing chamber and the second load lock chamber, the second buffer storage storing the work to be transferred therebetween.