Buffer Tank Gas Supply System for Epitaxy Pressure Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor epitaxy processes face challenges in maintaining optimal flow rates and pressures when using high- and low-pressure liquefied gases, as high-pressure gases cannot be transmitted effectively at low pressures, leading to inadequate operation of semiconductor apparatuses.
Innovation Solution
A gas-supply system incorporating gas containers, mass flow controllers, a buffer tank, and a pressure transducer that adjusts gas flow rates to maintain a predetermined pressure range, preventing liquefaction and ensuring stable gas delivery to semiconductor apparatuses, regardless of gas type.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stress or pressure
If high-pressure liquefied gas is transmitted at very high pressure, then flow rate and pressure requirements of epitaxy apparatus are satisfied, but gas cannot be transmitted effectively at low pressure
Solution Approach 1:
The patent changes the pressure parameter dynamically by using a buffer tank to decouple the high-pressure gas storage from the low-pressure process requirements. The buffer tank allows pressure to be maintained at storage while enabling low-pressure delivery during operation, resolving the contradiction between high-pressure transmission and low-pressure effectiveness
Solution Approach 2:
The buffer tank serves as an intermediary component between the high-pressure gas source and the epitaxy apparatus. It mediates the pressure transition, allowing gas to be stored at high pressure while delivering at the required low pressure for the semiconductor process, thus solving the transmission effectiveness problem
2Stress or pressure
If low-pressure liquefied gas is used, then gas transmission at high pressure is avoided, but flow rate and pressure requirements of epitaxy apparatus cannot be satisfied
Solution Approach 1:
The system maintains the low-pressure characteristic for transmission while using the buffer tank to ensure that the pressure and flow rate requirements are met during actual process operation. The buffer tank accumulates gas to provide sufficient pressure head for reliable apparatus operation without requiring high-pressure transmission infrastructure
3Stability of the object's composition
If gas flow rate is adjusted to maintain predetermined pressure range, then liquefaction is prevented and stable gas delivery is ensured, but system complexity increases
Solution Approach 1:
The patent implements a feedback control system where a pressure sensor monitors the pressure in the buffer tank and a mass flow controller adjusts the gas flow rate accordingly. When pressure drops below the predetermined range, the controller increases flow to maintain pressure, preventing liquefaction while managing system complexity through automated control
Solution Approach 2:
The system uses self-regulating components where the buffer tank naturally maintains pressure through its volume, and the mass flow controller automatically adjusts flow based on pressure feedback, reducing the need for complex manual intervention or additional active components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures consistent delivery pressure and flow rates for both high- and low-pressure gases, preventing apparatus malfunction and maintaining operational efficiency across varying conditions.
Implementation Method 1
a mass flow controller coupled to the gas container and configured to adjust a flow rate of gas flowing into the buffer tank from the gas container
Implementation Method 2
a pressure transducer disposed on the buffer tank and configured to generate a pressure signal according to a pressure of the gas in the buffer tank
Implementation Method 3
configured to maintain a pressure of gas flowing from the gas container in a predetermined pressure range
Data Source
AI summary
A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.