Buffered FinFET Device Hardening Against Single Event Upsets

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Solution Overview

Problem

FinFET devices are susceptible to single event upsets (SEUs) and electronic noise signals due to their small dimensions, which can compromise the operation and performance of integrated circuits, particularly in memory cells and analog circuit applications.

Innovation Solution

A buffered finFET device is fabricated with a p-n junction between the channel and the base of the vertical fin-shaped structure, utilizing a buffer layer of opposite doping polarity to the well region, which reduces SEUs and substrate noise, and is implemented in static memory cells and analog circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If finFET devices are made with small dimensions, then device density and integration are improved, but susceptibility to single event upsets and electronic noise increases

Engineering Contradiction:
Improvedevice densityVSAvoidsusceptibility to SEUs and noise
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A buffer layer with opposite doping polarity is introduced between the channel and the well region. This intermediary layer forms p-n junctions that act as potential barriers to intercept and collect charge carriers, preventing them from reaching sensitive nodes and causing SEUs or noise interference

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The p-n junctions formed by the buffer layer are designed to collect charge carriers that would otherwise cause harmful effects. By converting the harmful charge carriers into useful current at the p-n junctions, the device transforms potential damage into a beneficial effect that protects sensitive nodes

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

2Reliability

If a buffer layer is added to reduce SEUs and noise, then reliability is improved, but device complexity increases

Engineering Contradiction:
Improvehardening against radiation and noiseVSAvoidstructural complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The buffer layer is selectively formed only in specific regions where p-n junctions are needed for radiation hardening and noise isolation, rather than uniformly throughout the device. This localized approach provides protection where most needed while minimizing additional complexity

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The buffered finFET device effectively hardens against radiation-induced charge and reduces electronic noise, enhancing the reliability of memory cells and analog circuits by isolating noise and reducing the occurrence of SEUs.

Implementation Method 1

a p-n junction between the channel and the base of the vertical fin-shaped structure, utilizing a buffer layer of opposite doping polarity to the well region, which reduces SEUs and substrate noise

Methodology Applied
Scientific Effectp-n junction charge collection:

Implementation Method 2

The buffered finFET device effectively hardens against radiation-induced charge and reduces electronic noise, enhancing the reliability of memory cells and analog circuits by isolating noise and reducing the occurrence of SEUs

Methodology Applied
Scientific Effectnoise isolation:

Data Source

PatentEP2560209B1Buffered FinFET Device
Publication Date: 2020.02.19 ALTERA CORP
  • EP2560209B1 patent drawingFigure 1
  • EP2560209B1 patent drawingFigure 2~2C'
  • EP2560209B1 patent drawingFigure 3A-A'~3

AI summary

One embodiment relates to a buffered transistor device. The device includes a buffered vertical fin-shaped structure formed in a semiconductor substrate. The vertical fin-shaped structure includes at least an upper semiconductor layer, a buffer region, and at least part of a well region. The buffer region has a first doping polarity, and the well region has a second doping polarity which is opposite to the first doping polarity. At least one p-n junction that at least partially covers a horizontal cross section of the vertical fin-shaped structure is formed between the buffer and well regions. Other embodiments, aspects, and features are also disclosed.