Buried Connection Lines in Logic Cells to Ease Routing Congestion

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional memory devices face challenges in reducing the size of logic cells without decreasing the number of routing tracks, which leads to increased congestion and reduced array efficiency as memory cell arrays become denser and smaller.

Innovation Solution

The implementation of buried connection lines within the trench isolation region of logic cells allows for maintaining or increasing the number of routing tracks while decreasing the logic cell area, thereby preserving array efficiency without additional processing steps.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If the number of predetermined tracks in each standard cell is increased to provide more routing options, then routing congestion is relaxed, but the cell area increases due to minimum pitch requirements

Engineering Contradiction:
Improverouting congestionVSAvoidstandard cell area
Core Design Contradiction:
Device complexityVSArea of stationary object

Solution Approach 1:

The patent utilizes the vertical dimension by embedding connection lines within the trench isolation region beneath the active transistor area. This allows routing tracks to be added without increasing the horizontal cell footprint, as connections are established in the third dimension (depth) rather than expanding the planar grid.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The connection lines are nested within the trench isolation structure, which itself is embedded in the semiconductor substrate. This nested arrangement allows routing infrastructure to be contained within existing structural elements without occupying additional cell area.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Area of stationary object

If the memory cell array size is decreased to reduce memory device size, then device footprint is reduced, but the standard cell size must also be decreased which reduces the number of predetermined tracks for routing

Engineering Contradiction:
Improvememory cell array sizeVSAvoidnumber of predetermined tracks
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

By moving routing tracks into the vertical dimension (embedding in trench isolation), the patent decouples the relationship between cell area and number of tracks. Smaller cells can maintain adequate routing capacity because tracks are stacked vertically rather than requiring proportional horizontal space.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Area of stationary object

If the standard cell height is decreased to reduce cell area, then cell footprint is reduced, but the number of predetermined tracks in the row direction must be reduced

Engineering Contradiction:
Improvestandard cell areaVSAvoidnumber of predetermined tracks in row direction
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent compensates for reduced vertical space by creating horizontal routing tracks within the trench isolation region. This allows row-direction tracks to be embedded laterally beneath the active area, maintaining track count despite reduced cell height.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Area of stationary object

If the standard cell width is decreased to reduce cell area, then cell footprint is reduced, but the number of predetermined tracks in the column direction must be reduced

Engineering Contradiction:
Improvestandard cell areaVSAvoidnumber of predetermined tracks in column direction
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

Column-direction tracks are embedded within the trench isolation region, allowing vertical routing to be maintained even when cell width is reduced. The trench structure provides a protected pathway for column tracks that does not depend on horizontal cell dimensions.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS12063797B2Buried connection line for peripheral area of a memory device
Publication Date: 2024.08.13 MICRON TECHNOLOGY INC
  • US12063797B2 patent drawing
  • US12063797B2 patent drawing
  • US12063797B2 patent drawing

AI summary

An apparatus includes a substrate and a memory cell array disposed on the substrate. The apparatus also includes a logic cell disposed on the substrate in a peripheral region adjacent the memory cell array. The apparatus further includes a trench isolation region disposed in the substrate in the peripheral region. The trench isolation region either separates a first active area of the logic cell from a second active area of the logic cell or separates the logic cell from an adjacent logic cell. The logic cell includes a connection line that is buried within the trench isolation region. The connection line can be formed as an extension of a buried word line in the memory cell array region during a same fabrication process that forms the corresponding buried word line. By extending the buried word line into the peripheral region, the buried connection line can be formed without additional processing.