Bushing Unit Integrated Conductor Ion Acceleration
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Solution Overview
Problem
The existing ion accelerating devices for semiconductor wafer doping face challenges in maintaining proper high voltage design rules due to insufficient physical spacing between lenses in the acceleration column, which affects the efficient acceleration of ion beams.
Innovation Solution
The integration of bushing units with three conductors and coupled resistor circuit units allows for direct contact between adjacent bushing units, enabling a series of voltage degradations across lenses, ensuring proper voltage distribution and alignment without physical spacing, thus adhering to high voltage design rules.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional acceleration column design is used with graded voltage lenses, then ion beam acceleration is achieved, but physical spacing between adjacent lenses is insufficient to follow proper high voltage design rules
Solution Approach 1:
The acceleration column is divided into multiple discrete bushing units, each handling a specific voltage level. This segmentation allows each unit to be independently designed and positioned, enabling direct contact between adjacent units while maintaining proper voltage gradients through integrated resistors rather than relying on physical spacing.
Solution Approach 2:
Resistor circuits are introduced as intermediary elements within each bushing unit to provide voltage degradation. These resistors act as mediators that enable direct physical contact between bushing units while still maintaining the necessary voltage differences, replacing the need for physical spacing as the voltage isolation mechanism.
2Reliability
If physical spacing between lenses is increased to follow high voltage design rules, then voltage distribution is improved, but the acceleration column length increases and ion beam acceleration efficiency decreases
Solution Approach 1:
The invention changes the critical parameter from physical spacing to electrical resistance for voltage control. By using integrated resistor circuits with specific resistance values, the system maintains proper voltage distribution without requiring increased physical distance between lenses, thus preserving compact acceleration column design.
Solution Approach 2:
The resistor circuits are nested within the bushing units themselves, integrating the voltage control function directly into the structural components. This nesting eliminates the need for separate voltage control elements that would increase the overall length of the acceleration column.
3Ease of manufacture
If direct contact between adjacent bushing units is implemented, then assembly is simplified and vacuum integrity is maintained, but voltage isolation between units becomes more challenging
Solution Approach 1:
Each bushing unit is designed as a universal module that combines multiple functions: structural support, vacuum sealing, and voltage control. The integrated resistors provide voltage isolation while the direct contact maintains vacuum integrity, allowing simple assembly without compromising electrical isolation.
Solution Approach 2:
The bushing units are designed to be self-contained with all necessary voltage control elements integrated within each unit. This self-service design allows units to be assembled in direct contact without requiring external voltage isolation mechanisms, simplifying assembly while maintaining reliable voltage isolation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures efficient voltage supply to lenses within the ion accelerating device, maintaining high vacuum integrity and simplifying assembly, while allowing for precise monitoring of voltage conditions, thereby enhancing the ion implantation process.
Implementation Method 1
a voltage to the bushing unit may be degraded by the resistor circuit unit before reaching the lens
Data Source
AI summary
An ion accelerating device includes a series of bushing units and a series of resistor circuit units. Each resistor circuit unit is coupled to one bushing unit. A bushing unit includes three integrated conductors to establish connections to the coupled resistor circuit unit and to an immediately adjacent bushing unit such that a voltage to the bushing unit may be degraded by the resistor circuit unit before reaching the lens and that two bushing units may contact one another directly.


