Reaction By-Product Trap Structure for Uniform Semiconductor Gas Capture

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Solution Overview

Problem

Existing semiconductor manufacturing processes face inefficiencies in trapping reaction by-products, leading to reduced collection area utilization and shortened apparatus lifespan, with prior solutions experiencing clogging, reduced trapping efficiency, and external leakage of porous powders.

Innovation Solution

The apparatus employs a multi-stage internal trapping tower with planar cross-shaped vertical plates and vortex plates to guide gas flow, creating a reversed trapezoidal inner region for uniform trapping and preventing leaks, while the trapping cover captures reaction by-products in both inner and outer regions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the internal trapping tower uses a conventional structure with uniform width, then the apparatus is simple to manufacture, but the upper portion clogs first during use, reducing the available collection area and trapping efficiency

Engineering Contradiction:

Improvestructural simplicityVSAvoidtrapping efficiency

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

The internal trapping tower employs an inverted frustoconical structure where the upper portion has a larger diameter than the lower portion. This asymmetric geometry prevents clogging at the upper section by providing progressively increasing collection area from bottom to top, ensuring uniform trapping efficiency throughout the apparatus lifespan while maintaining manufacturability

Inventive Principle:

Principle #4Asymmetry

Solution Approach 2:

The invention transitions from a conventional cylindrical geometry to a conical geometry by introducing a dimensional variation in the radial direction. The diameter varies continuously along the vertical axis, creating an inverted frustoconical shape that optimizes gas flow distribution and trapping surface area utilization across different height levels

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Area of stationary object

If the internal trapping tower extends the collection area to utilize inner region space, then the available collection area increases, but the trapped porous powder reaction by-product may leak externally

Engineering Contradiction:

Improvecollection areaVSAvoidexternal leakage

Core Design Contradiction:

Area of stationary objectVSObject-generated harmful factors

Solution Approach 1:

The invention implements a nested structure where the internal trapping tower with extended collection area is contained within an outer housing. The trapping cover positioned at the lower end acts as an additional nested barrier that confines trapped porous powder reaction by-products, preventing their external leakage while maximizing the utilization of inner region space for collection

Inventive Principle:

Principle #7Nested doll (Nesting)

3Speed

If the gas flow velocity is high in the internal trapping tower, then the apparatus processes gas quickly, but the trapping reaction time is insufficient, reducing trapping efficiency

Engineering Contradiction:

Improvegas flow velocityVSAvoidtrapping reaction time

Core Design Contradiction:

SpeedVSDuration of action of moving object

Solution Approach 1:

The inverted frustoconical geometry creates a dynamic flow regime where gas velocity automatically adjusts along the vertical axis. The expanding cross-sectional area from bottom to top causes progressive deceleration of gas flow, extending the residence time and trapping reaction duration in the upper regions where collection area is largest, while maintaining higher processing speed in the lower sections

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration extends the available collection area, maintains trapping efficiency throughout the apparatus' use duration, and effectively prevents external leakage of reaction by-products, enhancing semiconductor manufacturing efficiency and reducing costs.

Implementation Method 1

the vortex plates installed along an outer lower periphery of the intermediate trapping unit of the internal trapping tower formed in multiple stages are provided to generate a vortex while reducing the flow velocity of the gas flowing downward

Methodology Applied

Scientific EffectVortex: Vortex Ring

Implementation Method 2

by arranging a plurality of planar cross-shaped vertical plates to be spaced apart from each other at predetermined intervals along a periphery direction

Methodology Applied

Scientific EffectGas flow guidance:

Implementation Method 3

a trapping cover 34 configured to prevent an external leak by trapping the reaction by-product in a porous powder form trapped in the inner and outer regions

Methodology Applied

Scientific EffectPhysical containment: Physical Containment

Data Source

PatentUS11872516B2Apparatus for trapping of reaction by-product with extended available collection area

Publication Date: 2024.01.16 MILAEBO

AI summary

The present disclosure relates to an apparatus for trapping of a reaction by-product with an extended available collection area. The configuration of the present disclosure relates to an apparatus for trapping of a reaction by-product, which is configured to accommodate gas, which is discharged after a deposition process during a semiconductor manufacturing process, in a housing (1), heat the gas with a heater (2), trap a reaction by-product contained in the gas by using an internal trapping tower (3), and discharge only the gas.