C-Router Color Seeding for Double Patterning Lithography Routing
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Solution Overview
Problem
Current electronic design automation (EDA) tools lack efficient methods for implementing routing in double patterning lithography, leading to errors and excessive resource costs due to the need for post-route layout decomposition and re-routing.
Innovation Solution
A three-phase routing scheme comprising a global router, a C-router, and a detail router, with the C-router providing double patterning color seeding and the detail router using space-tiles for correct-by-construction routing in double patterning lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If post-route layout decomposition is used for double patterning lithography, then routing can be performed with existing EDA tools, but errors occur and excessive resource costs are incurred
Solution Approach 1:
The patent applies preliminary action by performing color assignment during the routing phase itself rather than as a post-processing step. The C-router assigns colors to routing segments as it creates the routing, ensuring that the decomposition is done correctly from the outset. This prevents the need for error-prone post-route decomposition while maintaining compatibility with double patterning lithography requirements.
2Productivity
If post-route layout decomposition is performed, then routing can be completed with standard tools, but re-routing is required leading to excessive resource costs
Solution Approach 1:
The invention performs color assignment and decomposition during the routing process itself through the C-router, rather than as a subsequent step. This preliminary integration of decomposition into routing eliminates the need for time-consuming re-routing operations, as the routing is created with correct color assignments from the beginning.
Solution Approach 2:
The patent merges the routing and decomposition processes into a single integrated operation performed by the C-router. Instead of separating routing completion and decomposition into distinct phases that require iterative re-routing, the system combines these functions, allowing routing segments to be assigned colors and decomposed simultaneously, thereby eliminating redundant re-routing cycles.
3Adaptability or versatility
If standard EDA tools are used for double patterning lithography routing, then tool availability is maintained, but the routing process requires costly layout decomposition
Solution Approach 1:
The C-router is designed with multi-functionality, serving both as a routing tool and a decomposition tool. It performs color assignment, routing segment creation, and layout decomposition all within a single integrated process. This universal approach maintains compatibility with standard EDA tool workflows while eliminating the need for separate, complex decomposition tools and processes.
Data Source
AI summary
Disclosed are a method, apparatus, and computer program product to implement routing for double patterning lithography. A three-phase routing scheme is employed, comprising a global router, a C-router, and a detail router. The C-router provides double patterning color seeding for shapes on routing tracks in the electronic design. The detail router employs space-tiles to perform double-patterning based routing for wires in the electronic design.