Calibration Substrate Layout for Infrared Temperature Alignment
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Solution Overview
Problem
Existing substrate processing systems face challenges in accurately measuring temperature distribution due to misalignment of radiation temperature sensors, leading to deviations in measured values despite uniform temperature profiles across substrates.
Innovation Solution
A calibration substrate with distinct emissivity regions is used to calibrate radiation temperature sensors by capturing temperature distributions, allowing for precise alignment and correction of sensor measurements through boundary line superimposition and recalibration of measurement targets.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If radiation temperature sensors are used to measure temperature distribution across substrates in multiple processing units, then temperature monitoring capability is improved, but measurement precision deteriorates due to sensor misalignment and positioning variations
Solution Approach 1:
The patent applies preliminary action by performing calibration measurements before actual substrate processing. A calibration substrate with known uniform temperature is measured first to establish reference data, which is then used to correct subsequent measurements. This preliminary calibration step eliminates the need for complex real-time alignment adjustments during production.
Solution Approach 2:
The patent uses a calibration substrate that replicates the thermal characteristics and dimensions of actual substrates. By creating a copy with known properties (uniform temperature distribution), the system can establish reference measurement patterns that account for sensor positioning variations, thereby improving measurement precision without requiring perfect sensor alignment.
2Temperature
If multiple radiation temperature sensors are deployed across processing units, then temperature coverage is improved, but device complexity increases due to calibration and alignment requirements
Solution Approach 1:
The patent changes the approach from adjusting physical sensor parameters (position, angle) to changing data parameters through calibration. By measuring temperature distributions on a calibration substrate and storing reference data, the system transforms the complexity from mechanical alignment to data processing, significantly reducing device complexity while maintaining broad temperature coverage.
Solution Approach 2:
The calibration substrate serves itself by providing known reference temperature distributions that automatically reveal sensor positioning errors. The system uses the calibration substrate's uniform temperature properties to self-diagnose and self-correct measurement inaccuracies, eliminating the need for external alignment tools or complex calibration procedures.
3Ease of manufacture
If sensor positions are fixed in processing chambers, then installation simplicity is improved, but measurement accuracy deteriorates when substrates are positioned at different locations
Solution Approach 1:
The patent introduces a calibration substrate as an intermediary between the fixed sensor and the variable substrate positions. The calibration substrate is placed at each substrate position during calibration to capture the specific measurement pattern for that location. This intermediary allows fixed sensors to accurately measure moving substrates by referencing the pre-captured calibration data.
Solution Approach 2:
The system performs preliminary measurements at all possible substrate positions using the calibration substrate before actual processing begins. This preliminary action creates a library of reference measurement patterns that enables accurate temperature measurement regardless of where substrates are positioned during production, maintaining installation simplicity while improving measurement precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The calibration method enhances the accuracy of temperature measurement across multiple processing units, ensuring consistent and reliable temperature data for substrate processing.
Implementation Method 1
a radiation temperature sensor that detects infrared radiation emitted from the substrate or the calibration substrate
Implementation Method 2
a heating unit that heats the substrate or the calibration substrate held by the holding unit
Data Source
AI summary
A substrate processing apparatus includes a holding unit that holds a substrate or a calibration substrate, a heating unit that heats the substrate or the calibration substrate held by the holding unit, and a radiation temperature sensor that detects infrared radiation emitted from the substrate or the calibration substrate and measures temperature distribution of the substrate or the calibration substrate. The calibration substrate includes a first main surface facing the heating unit and a second main surface opposite the first main surface and measured for temperature distribution by the radiation temperature sensor. The second main surface includes a first portion where a first material is exposed, and a second portion where a second material with a lower emissivity than the first material is exposed.