Capacitive Plasma Reactor for Contaminant Removal
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Solution Overview
Problem
Current plasma reactors for removing contaminants in semiconductor and solar cell manufacturing processes are expensive, have high maintenance costs, and suffer from non-uniform plasma generation due to low discharge stability, leading to reduced durability and lifespan of vacuum pumps.
Innovation Solution
A plasma reactor with a simple structure and low installation and maintenance costs, featuring a driving electrode in an annular or cylindrical shape, positioned at a distance from ground electrodes, and applying uniform voltage to generate stable and uniform plasma, improving plasma discharge efficiency and contaminant decomposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If inductively coupled plasma reactor with coil-shaped driving electrode is used, then plasma generation capability is improved, but installation cost and maintenance cost increase significantly due to expensive RF power supply
Solution Approach 1:
The patent replaces the inductively coupled plasma system (requiring expensive RF power supply and coil electrodes) with a capacitively coupled plasma system using simple parallel plate electrodes connected to a standard high voltage power supply, thereby eliminating complex electromagnetic induction components while maintaining plasma generation capability
Solution Approach 2:
The patent uses simple, inexpensive parallel plate electrodes instead of expensive coil-shaped driving electrodes and RF power supplies, accepting that these simpler components may require replacement but significantly reducing initial installation and ongoing maintenance costs
2Power
If inductively coupled plasma reactor is used, then plasma generation is achieved, but plasma uniformity deteriorates due to low discharge stability
Solution Approach 1:
The patent employs parallel plate electrodes that create a uniform electric field across the plasma generation space, ensuring equipotential distribution and stable plasma discharge, thereby achieving uniform plasma composition and density throughout the reaction chamber
3Reliability
If plasma reactor is installed to remove contaminants, then vacuum pump durability is improved, but power consumption increases due to high power required for plasma maintenance
Solution Approach 1:
The patent optimizes plasma generation parameters including using lower power high voltage AC signals instead of high power RF signals, adjusting electrode spacing and gas flow rates to achieve effective contaminant removal with minimal power consumption while maintaining vacuum pump protection
4Device complexity
If simple plasma reactor structure is used, then installation cost is reduced, but contaminant removal efficiency deteriorates due to insufficient plasma generation
Solution Approach 1:
The patent divides the plasma generation process into optimized zones using multiple electrode pairs arranged in series, where each segment contributes to progressive contaminant decomposition, achieving high removal efficiency through cumulative effect while maintaining simple overall structure
Solution Approach 2:
The patent optimizes local plasma generation conditions at different positions along the contaminant flow path, with electrode spacing and voltage parameters tailored to maximize decomposition efficiency at each stage while keeping the overall system simple
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables effective removal of various contaminants with reduced power consumption, increased plasma density, and reduced pressure dependence of contaminant removal efficiency, leading to stable operation and extended lifespan of equipment.
Implementation Method 1
A plasma reactor for removal of contaminants, which includes a dielectric body forming a plasma generation space inside the plasma reactor, a ground electrode connected to one end of the dielectric body, and a driving electrode fixed to an outer peripheral surface of the dielectric body and receiving a voltage
Implementation Method 2
The present invention uses a capacitively coupled plasma method instead of inductively coupled plasma, with electrodes disposed in parallel to each other, thereby discharge efficiency can be improved
Data Source
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AI summary
Provided is a plasma reactor for removal of contaminants, which is installed between a process chamber and a vacuum pump and removes contaminants emitted from a process chamber. The plasma reactor includes: at least one dielectric body that forms a plasma generation space therein; a ground electrode connected to at least one end of the dielectric body; and at least one driving electrode fixed to an outer peripheral surface of the dielectric body, and connected to an AC power supply unit to receive an AC driving voltage. The ground electrode has a non-uniform diameter along the lengthwise direction of the plasma reactor.