DRAM Memory Cell Capacitor Dielectric Directly Against Source Drain

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Solution Overview

Problem

As integrated circuitry shrinks, the size of storage capacitors in DRAM cells decreases, leading to reduced charge retention and increased difficulty in maintaining performance, with reading operations being destructive and requiring frequent refreshes.

Innovation Solution

A memory cell design incorporating a transistor device and a capacitor with a unique configuration where one capacitor electrode is electrically coupled to the channel, allowing for non-destructive reading and reduced parasitic capacitance, enabling high read speed and extended retention time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If the size of storage capacitor is reduced to shrink memory cell size, then the quantity of charge and retention time decreases, but smaller capacitor size is needed for denser integrated circuitry

Engineering Contradiction:
Improvememory cell sizeVSAvoidcharge retention time
Core Design Contradiction:
Volume of moving objectVSDuration of action of stationary object

Solution Approach 1:

The patent merges the storage capacitor function with the transistor source/drain structure by forming the capacitor dielectric directly against the source/drain region. This integration allows the capacitor to share space with the transistor structure, reducing the overall memory cell footprint while maintaining adequate charge retention capability through the direct coupling configuration.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent utilizes vertical stacking by forming the capacitor dielectric layer directly against the source/drain region in a vertical orientation. This three-dimensional arrangement allows the capacitor and transistor to occupy different spatial dimensions, enabling higher density without compromising charge retention time.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Measurement precision

If conventional DRAM reading is performed, then the read state can be determined, but the reading act is destructive and requires immediate rewriting

Engineering Contradiction:
Improveread state determinationVSAvoidrefresh time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent introduces a tunnel oxide layer as an intermediary between the capacitor dielectric and the source/drain region. This thin insulating barrier enables non-destructive reading by allowing charge to be sensed through the oxide without complete discharge, thereby determining the read state while preserving the stored charge and eliminating the need for immediate rewriting.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Speed

If capacitor dielectric is formed directly against source/drain region, then parasitic capacitance is reduced and read speed increases, but manufacturing precision requirements increase

Engineering Contradiction:
Improveread speedVSAvoidcapacitor dielectric positioning
Core Design Contradiction:
SpeedVSManufacturing precision

Solution Approach 1:

The patent forms the capacitor dielectric layer directly against the source/drain region during the transistor fabrication process itself, before subsequent processing steps. This preliminary formation ensures proper alignment and minimizes parasitic capacitance from the outset, while the dielectric material's inherent properties provide tolerance for manufacturing variations.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables non-destructive reading, reduces refresh time, and minimizes individual memory cell size while maintaining high read speed and charge retention, even with small storage capacitance.

Implementation Method 1

a capacitor comprising a pair of capacitor electrodes having a capacitor dielectric there-between

Methodology Applied
Scientific EffectCapacitance: Capacitance

Implementation Method 2

A tunnel oxide layer may be interposed between the capacitor dielectric and the source/drain regions

Methodology Applied
Scientific EffectQuantum tunneling:

Implementation Method 3

the channel region between the pair of source/drain regions becomes conductive

Methodology Applied
Scientific EffectElectrical conduction: Conduction (electrical)

Data Source

PatentUS9059030B2Memory cells having capacitor dielectric directly against a transistor source/drain region
Publication Date: 2015.06.16 MICRON TECHNOLOGY INC
  • US9059030B2 patent drawing
  • US9059030B2 patent drawing
  • US9059030B2 patent drawing

AI summary

A memory cell includes a transistor device comprising a pair of source/drains, a body comprising a channel, and a gate construction operatively proximate the channel. The memory cell includes a capacitor comprising a pair of capacitor electrodes having a capacitor dielectric there-between. One of the capacitor electrodes is the channel or is electrically coupled to the channel. The other of the capacitor electrodes includes a portion of the body other than the channel. Methods are also disclosed.