Capture Module Mesh Net Suppresses Liquid Scattering

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Solution Overview

Problem

In substrate processing, the scattering of liquids during high-speed rotation leads to contamination and process defects due to the diffusion of contaminants to unintended locations.

Innovation Solution

A substrate processing apparatus and method that includes a capture module with a mesh net structure inside a processing container to suppress liquid scattering, using a polypropylene material with adjustable thickness and position, capable of capturing and cleaning scattered liquids, thereby preventing re-scattering and contaminant diffusion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If liquid is discharged to the rotating substrate at high speed, then substrate processing efficiency is improved, but liquid scatters to unintended locations causing contamination

Engineering Contradiction:
Improvesubstrate processing efficiencyVSAvoidcontamination
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

A capture module is introduced as an intermediary component between the substrate and the processing container wall. This module intercepts scattered liquid before it reaches unintended locations, preventing contamination while allowing high-speed substrate processing to continue. The capture module acts as a mediator that captures scattered liquid and redirects it back to the substrate area.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The scattered liquid, which originally represents a harmful contamination source, is converted into a beneficial resource by redirecting it back to the substrate area. The capture module intercepts the scattered liquid and guides it back, transforming the harmful scattering effect into a beneficial recirculation that maintains processing efficiency while preventing contamination.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

2Speed

If liquid is discharged at high speed to the substrate, then processing speed is improved, but contaminants diffuse to unintended locations

Engineering Contradiction:
Improveprocessing speedVSAvoidcontaminant diffusion
Core Design Contradiction:
SpeedVSLoss of substance

Solution Approach 1:

The capture module serves as an intermediary that intercepts liquid carrying contaminants before it can diffuse to unintended locations. By positioning the capture module in the scattering path, it prevents contaminant loss while maintaining high processing speed.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system implements a feedback mechanism where scattered liquid is captured and redirected back to the substrate area. This feedback loop ensures that contaminants are not lost but rather recirculated, maintaining both processing speed and contaminant control.

Inventive Principle:
Principle #23Feedback

3Object-affected harmful factors

If a capture module is added to prevent liquid scattering, then contamination is reduced, but device complexity increases

Engineering Contradiction:
ImprovecontaminationVSAvoidapparatus complexity
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The capture module utilizes a mesh net structure, which is a thin film approach. This allows the contamination prevention function to be achieved with a relatively simple, lightweight component rather than a complex rigid structure, thereby minimizing the increase in device complexity.

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The mesh net structure of the capture module employs porous material principles, allowing liquid to pass through while capturing scattered droplets. This simple porous structure achieves contamination prevention without requiring complex mechanical or electronic systems.

Inventive Principle:
Principle #31Porous materials

4Object-affected harmful factors

If mesh net structure is used to capture liquid, then liquid scattering is suppressed, but manufacturing precision requirements increase

Engineering Contradiction:
Improveliquid scatteringVSAvoidmesh net specifications
Core Design Contradiction:
Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The patent specifies parameter ranges for the mesh net structure (thickness: 0.5T to 1T, width: at least 10mm) rather than requiring precise fixed values. This parameter change approach allows manufacturing within acceptable ranges, reducing the stringency of manufacturing precision requirements while still achieving effective liquid scattering suppression.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively controls liquid scattering, prevents contamination by directing scattered liquids back into the processing container for capture and cleaning, minimizing process defects and contaminant diffusion.

Implementation Method 1

a capture module provided in the processing container to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering

Methodology Applied
Scientific EffectPhysical absorption through mesh net structure: Absorption (physical)

Implementation Method 2

The capture module may include a polypropylene (PP) material. The specifications of the capture module may include a thickness in a range of 0.5 T to 1 T, and a width of at least 10 mm

Methodology Applied
Scientific EffectFiltration through porous material: Filter (physical)

Data Source

PatentUS11897006B2Apparatus and method for processing substrate
Publication Date: 2024.02.13 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US11897006B2 patent drawing
  • US11897006B2 patent drawing
  • US11897006B2 patent drawing

AI summary

The present disclosure provides a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support unit configured to support a substrate, a liquid supply unit configured to supply a liquid containing any one of a chemical liquid and a cleaning liquid to the substrate supported by the substrate support unit, a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit, and a capture module provided in the processing container to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering.