Carboxylate Resist Composition for Low Line Edge Roughness

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Solution Overview

Problem

Existing resist compositions exhibit high line edge roughness (LER) in resist patterns, which affects the precision and quality of microfabrication processes.

Innovation Solution

The development of a carboxylate-based resist composition containing a specific salt and resin structure, represented by formulas (I) and (IP), which improve the line edge roughness by optimizing the structural units and substituents to enhance pattern formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional resist composition is used, then the manufacturing process is simple, but the line edge roughness is high

Engineering Contradiction:

Improveline edge roughnessVSAvoidresin structure complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies parameter changes by systematically varying the chemical structure of the carboxylate salt, specifically changing the hydrocarbon group parameters (carbon atom count, branching structure) and substituent types (halogen atoms, ether bonds, ester bonds) to optimize pattern formation and reduce line edge roughness while maintaining manufacturing feasibility

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent employs composite materials by creating a resist composition that combines a specifically structured carboxylate salt with a resin containing structural units represented by formula (IP), where the composite interaction between the salt and resin components works synergistically to improve line edge roughness beyond what either component could achieve alone

Inventive Principle:

Principle #40Composite materials

2Manufacturing precision

If the resin structure is optimized to reduce line edge roughness, then the pattern precision improves, but the synthesis complexity increases

Engineering Contradiction:

Improvepattern precisionVSAvoidsynthesis ease

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent applies local quality by introducing specific functional groups (halogen atoms at positions R4-R9, ether bonds at X01-X03, ester bonds) at localized positions within the carboxylate salt molecule and resin structure, where these localized structural modifications precisely control pattern formation characteristics without requiring complete restructuring of the entire molecule

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent employs segmentation by dividing the resin structure into distinct structural units represented by formula (IP), where each unit contains specific functional groups that can be independently optimized, allowing systematic improvement of pattern precision through modular structural design rather than holistic redesign

Inventive Principle:

Principle #1Segmentation

Data Source

PatentUS12578639B2Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern

Publication Date: 2026.03.17 SUMITOMO CHEM CO LTD

AI summary

A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resit composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I).