Carboxylate Resist Composition for Lower Mask Error Factor
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Solution Overview
Problem
Existing resist compositions form resist patterns with high mask error factors (MEF), which affect the precision and accuracy of the patterning process.
Innovation Solution
A carboxylate represented by formula (I) and a resin with a structural unit represented by formula (IP) are used in resist compositions to improve the mask error factor (MEF) of the resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing resist compositions are used, then the resist pattern can be formed, but the mask error factor (MEF) is high which degrades pattern accuracy
Solution Approach 1:
The patent changes the chemical structure parameters of the resin by introducing specific structural units with formula (IP) containing carboxylate groups at defined positions. This structural modification alters the resist composition's properties to reduce MEF and improve pattern accuracy
Solution Approach 2:
The patent creates a composite resist composition by combining the newly designed resin with specific structural units with formula (IP) and carboxylate compounds with formula (I). This composite approach synergistically improves both MEF and pattern accuracy beyond what individual components could achieve
Data Source
AI summary
A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resit composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I).