Carboxylate Resin Resist Composition Pattern Collapse Margin
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Solution Overview
Problem
Existing resist compositions used for forming resist patterns suffer from inadequate pattern collapse margin (PCM), leading to poor pattern integrity and stability during the resist pattern formation process.
Innovation Solution
A carboxylate represented by formula (I) is introduced, which includes a hydrocarbon group L1, a halogen atom or hydrocarbon group R2, and specific bonding configurations, to enhance the pattern collapse margin in resist compositions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional resist compositions are used, then the resist pattern formation process can be completed, but the pattern collapse margin is insufficient leading to poor pattern integrity
Solution Approach 1:
The patent changes the chemical composition parameters of the resist material by introducing a specific carboxylate compound with defined molecular structure (formula I) containing hydrocarbon groups L1 and R2, halogen atoms, and specific bonding configurations. This parameter change in material composition directly improves the pattern collapse margin and pattern integrity without affecting the overall resist pattern formation process
Solution Approach 2:
The patent creates a composite resist composition by combining the specifically structured carboxylate compound (formula I) with other resist components. This composite material approach allows the carboxylate to provide enhanced pattern collapse margin while maintaining compatibility with existing resist system requirements, thereby improving pattern integrity
Data Source
AI summary
A carboxylate represented by formula (I), a carboxylate or resin including a structural unit represented by formula (IP), an acid generator including the carboxylate, a carboxylic acid generator including the resin, or a resist composition including the carboxylic acid generator.