Carboxylate Resist Composition for Higher Pattern Collapse Margin
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Solution Overview
Problem
Existing resist compositions do not provide sufficient pattern collapse margin (PCM) for resist patterns.
Innovation Solution
A carboxylate represented by formula (I) is used in a resist composition, which includes a carboxylate and an acid generator, along with a resin containing acid-labile groups, to form resist patterns with improved pattern collapse margin.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional carboxylates are used in resist composition, then the resist pattern can be formed, but the pattern collapse margin is insufficient
Solution Approach 1:
The patent modifies the molecular structure parameters of the carboxylate by introducing specific structural features: a carbonyl group at the α-position relative to the carboxylate group, and a heteroatom (O, S, or Se) in the aromatic ring at the para-position relative to the carbonyl group. These parameter changes in the molecular structure improve the pattern collapse margin while maintaining resist pattern formation capability.
Solution Approach 2:
The patent creates a composite carboxylate structure combining multiple functional groups: the aromatic ring system, the carbonyl group, the heteroatom, and the carboxylate group. This composite structure integrates the benefits of each component - the aromatic ring provides structural framework, the carbonyl group enhances acid-generating efficiency, and the heteroatom improves thermal stability, collectively achieving better pattern collapse margin.
2Stability of the object's composition
If the carboxylate structure is modified to improve pattern collapse margin, then the pattern stability improves, but the molecular structure complexity increases
Solution Approach 1:
The patent applies local quality modification by introducing specific functional groups at specific positions in the molecular structure. Rather than changing the entire molecule, only specific locations are modified: the α-position relative to the carboxylate group and the para-position of the aromatic ring. This localized approach improves pattern stability while minimizing overall molecular complexity.
Solution Approach 2:
The carboxylate molecule is segmented into distinct functional regions: the aromatic ring system, the carbonyl group, the heteroatom, and the carboxylate group. Each segment performs a specific function - the aromatic ring provides structural stability, the carbonyl group enhances acid generation, and the heteroatom improves thermal properties. This segmentation allows independent optimization of each segment to achieve overall pattern stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition enables the production of resist patterns with enhanced pattern collapse margin, ensuring better stability and integrity during processing.
Implementation Method 1
a carboxylate forming a resist pattern with pattern collapse margin (PCM) which is better than that formed by the above resist composition including a carboxylate
Data Source
AI summary
Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition:wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group, R3 represents *—O—R10, *—O—CO—R10, etc., R10 represents an acid-labile group, R4 represents a halogen atom, a haloalkyl group or a hydrocarbon group, the hydrocarbon group may have a substituent, —CH2— included in the haloalkyl group and the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, m4 represents an integer of 0 to 8, and Z+ represents an organic cation.