Carrier Wafer Guard Ring for Stable Die Placement
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge in semiconductor manufacturing is the unpredictable detachment of dies from the wafer carrier during the dicing and cleaning processes, leading to defects in die placement, particularly in complex three-dimensional packages like System on Integrated Chip (SoIC) and System in Package (SiP), which affects yield and manufacturing efficiency.
Innovation Solution
The implementation of a guard ring around the perimeter of the wafer substrate using an adhesive material to provide consolidation forces, combined with a dielectric layer and carrier wafers, ensures that dies remain securely attached during handling and placement, reducing defects by stabilizing them against air knife cleaning pressures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If dies are attached to wafer carrier using conventional adhesive methods, then die placement can proceed, but dies may detach unpredictably during dicing and cleaning processes causing defects
Solution Approach 1:
The patent applies preliminary action by forming a guard ring structure around the perimeter of the wafer substrate before the dicing and cleaning processes. This guard ring, formed from adhesive material, pre-establishes consolidation forces that will counteract the air knife pressures during cleaning, preventing die detachment before the harmful effect can occur.
Solution Approach 2:
The guard ring structure serves as beforehand cushioning by providing a protective adhesive barrier around the wafer perimeter. This structure is prepared in advance to absorb and counteract the detaching forces during cleaning, cushioning the dies against the harmful air knife pressures that would otherwise cause detachment defects.
2Reliability
If guard ring is added around wafer perimeter, then die detachment is prevented, but manufacturing process complexity increases
Solution Approach 1:
The guard ring structure performs multiple functions: it provides consolidation forces to prevent die detachment, defines the wafer perimeter, and works integrally with the existing adhesive material already used in the process. By making the guard ring from the same adhesive material used for die attachment, the system achieves multi-functionality without adding fundamentally new process steps.
Solution Approach 2:
The patent applies parameter changes by modifying the adhesive material distribution pattern - forming it not only under the dies but also as a continuous guard ring around the perimeter. This changes the spatial parameters of adhesive application, creating a protective boundary that enhances die stability without requiring different materials or fundamentally new process equipment.
3Productivity
If conventional cleaning processes are used, then manufacturing efficiency is maintained, but die detachment causes defects reducing yield
Solution Approach 1:
The guard ring structure implements preliminary anti-action by pre-establishing consolidating forces that directly counteract the detaching effect of air knife cleaning pressures. This anti-action is built into the structure before cleaning occurs, allowing conventional cleaning processes to proceed at full efficiency while the guard ring prevents the harmful detachment effect.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively minimizes defects during die placement, enhancing yield and manufacturing efficiency without requiring additional processing steps or masks, by maintaining die integrity throughout the fabrication process.
Implementation Method 1
an adhesive material to form a guard ring around a perimeter of the carrier wafer
Implementation Method 2
stabilizing them against air knife cleaning pressures
Data Source
AI summary
A die transfer system includes a carrier wafer with an adhesive layer on an upper surface of the carrier wafer that comprises a patterned bottom layer and a guard ring over a perimeter of the carrier wafer.


