Cascaded L-Section Impedance Matching for RF Plasma Voltage Stress

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Solution Overview

Problem

Commercially available impedance matching networks for inductively coupled plasma systems are inadequate for large inductances, leading to high voltage stress and potential failure, and are not flexible enough to accommodate various inductor configurations, limiting the practicality of applications such as atmospheric pressure plasma fiber reheat and vacuum plasma fiber blank consolidation.

Innovation Solution

A system with an RF power source, an RF matching network, and an impedance matching circuit that includes adjustable capacitors to match impedance and reduce voltage stress, allowing for the use of a single RF generator and impedance tuning network across various inductively coupled plasma applications, including a plasma containment tube with a cooling system and a plasma source gas supply.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If commercially available impedance matching networks are used with large inductances, then the system can operate with standard equipment, but the voltage stress exceeds component ratings leading to potential failure

Engineering Contradiction:
Improvesystem reliabilityVSAvoidvoltage stress
Core Design Contradiction:
ReliabilityVSStress or pressure

Solution Approach 1:

The impedance matching circuit is divided into multiple L-section networks connected in cascade. Each L-section handles a portion of the impedance transformation, distributing the voltage stress across multiple components rather than concentrating it in a single matching network. This segmentation allows standard commercial components to operate within their ratings while achieving the required impedance match for large inductances.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If a single RF generator and impedance tuning network are used across various inductor configurations, then equipment cost is reduced and flexibility is improved, but the existing networks are inadequate for large inductances

Engineering Contradiction:
Improveadaptability to various inductor configurationsVSAvoidnetwork adequacy
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The cascaded L-section impedance matching circuit provides a universal solution that can accommodate various inductor configurations and inductance values using standard commercial components. By adjusting the component values in each L-section, the same basic circuit topology can match different impedances and handle different inductor sizes, making the system universally applicable while maintaining reliability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the use of commercially standard impedance matching networks without exceeding their specifications, providing capital equipment cost savings, ease of component replacement, and adaptation for various plasma inductor requirements, while maintaining the load impedance within the tuning range of commercial autotuning matching networks.

Implementation Method 1

the impedance of the matching components plus the impedance of the inductor must present a 50.0Ω+j0Ω impedance to the RF generator

Methodology Applied
Scientific EffectImpedance matching:

Implementation Method 2

a sharp tune point for the inductor

Methodology Applied
Scientific EffectElectrical resonance:

Implementation Method 3

the magnetic field from the inductor traps the electrons and ions and forces them to spiral around the magnetic field lines in a concentrated volume space

Methodology Applied
Scientific EffectMagnetic field: Magnetic Field

Implementation Method 4

Inductively coupled plasmas are used at atmospheric pressures where the mean free path is only 68 nm and is primarily magnetic field dominated

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 5

The voltage on the inductor is given by: where the voltage on the inductor VL is equal to the inductance L times the rate of change of the current (di/dt)

Methodology Applied
Scientific EffectInductive voltage generation:

Data Source

PatentUS11621147B2Systems and methods for optimizing RF plasma power coupling
Publication Date: 2023.04.04 CORNING INC
  • US11621147B2 patent drawing
  • US11621147B2 patent drawing
  • US11621147B2 patent drawing

AI summary

A system, having: an RF power source; an RF matching network electrically coupled to the RF power source; an impedance matching circuit electrically coupled to the RF matching network, wherein the impedance matching circuit has a first adjustable capacitor connected in series with the RF matching network and a second adjustable capacitor connected in parallel with the first capacitor; and an inductive process load electrically coupled to the impedance matching circuit.