Noble Metal Catalytic Layer Assessment for MacEtch Precision
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Solution Overview
Problem
The challenge lies in determining whether a catalytic layer of noble metal is properly formed for effective etching of semiconductor substrates using the MacEtch method, as existing methods lack efficient means to assess the layer's suitability for etching.
Innovation Solution
A processing system comprising a catalytic layer forming device, a determination device with XRF analysis and a laser microscope, and an etching device, which forms a catalytic layer on a substrate, determines its suitability for etching by measuring thickness, deposition amount, and density within predetermined ranges before proceeding with the etching process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a catalytic layer of noble metal is formed onto a substrate using the MacEtch method, then deep grooves with high aspect ratio can be etched into the substrate, but it is difficult to determine whether the catalytic layer is properly formed for effective etching
Solution Approach 1:
The patent applies preliminary action by measuring the thickness, deposition amount, and density of the catalytic layer before the etching process to determine whether the layer is properly formed. This pre-assessment allows optimization of etching conditions in advance, ensuring deep grooves with high aspect ratio can be achieved while avoiding detection difficulties during or after etching.
2Reliability
If the catalytic layer is not properly formed, then etching effectiveness is reduced, but existing methods lack efficient means to assess layer suitability
Solution Approach 1:
The patent segments the assessment of catalytic layer suitability into three independent measurement components: thickness measurement, deposition amount measurement, and density measurement. Each component can be measured separately using standard techniques, and their combined evaluation determines overall layer suitability. This segmentation maintains high etching effectiveness while avoiding the need for a single complex assessment device.
3Manufacturing precision
If multiple measurement parameters are used to determine catalytic layer suitability, then etching quality is improved, but measurement and analysis complexity increases
Solution Approach 1:
The patent applies self-service by using the catalytic layer itself to generate characteristic X-rays for density measurement through XRF analysis. The noble metal atoms in the catalytic layer naturally emit characteristic radiation when irradiated with X-rays, eliminating the need for external reference standards or complex calibration procedures. This self-characterizing property simplifies the measurement of multiple parameters while maintaining high precision in catalytic layer formation assessment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures the catalytic layer is formed in an optimal state for etching, enhancing vertical etching workability and uniformity, preventing needle-like residual formations and excessive side etching, thereby improving the quality of the etched substrate.
Implementation Method 1
an X-Ray Fluorescence (XRF) analysis device 11
Implementation Method 2
a laser microscope 12
Implementation Method 3
using the noble metal of the catalytic layer to act as a catalyst
Data Source
Figure 1
Figure 2~4
Figure 5
AI summary
According to one embodiment, in a processing system (1) and determining method, a X-ray intensity (I) of character X-rays generated by irradiating a catalytic layer (22) of a noble metal formed on a surface of a substrate (21) with X-rays is detected. In the processing system (1) and the determining method, either the detected X-ray intensity (I) or a parameter calculated using the X-ray intensity (I) is obtained as a determination parameter. In the processing system (1) and the determining method, based at least on the determination parameter, whether or not the catalytic layer (22) has been formed into a state suitable for etching the surface of the substrate (21) is determined.