Cavitation-Based Substrate Treatment Nozzle for Bubble Extraction
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Solution Overview
Problem
Existing degassing apparatuses in semiconductor processes damage the thin gas permeation layer due to continuous vacuum load, limiting flow rate and requiring a separate drain pump, and are bulky due to the need for close proximity to the nozzle.
Innovation Solution
A substrate treatment equipment with a dissolved gas extraction nozzle that uses a cavitation phenomenon to extract bubbles from the treatment solution, integrated with a bellows pump and control unit to manage the bubble removal process, allowing for efficient bubble separation and removal without damaging the equipment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If vacuum pulling method is used to extract bubbles from treatment solution, then bubble removal efficiency is improved, but the thin gas permeation layer is damaged due to continuous vacuum load
Solution Approach 1:
The patent replaces the mechanical vacuum pulling system with an acoustic cavitation system. Ultrasonic waves are applied to the treatment solution to generate cavitation bubbles that implode, creating micro-shocks that separate gas bubbles from the liquid. This substitution eliminates the need for continuous vacuum application to the permeation layer while achieving effective degassing.
Solution Approach 2:
The patent utilizes the phase transition phenomenon of cavitation - the formation and implosion of micro-bubbles in the treatment solution under ultrasonic influence. This phase transition creates localized high-pressure zones that effectively separate dissolved gases from the liquid without requiring external vacuum pressure on the permeation layer.
2Productivity
If vacuum force is increased to improve bubble extraction, then degassing efficiency is improved, but the thin layer is easily torn
Solution Approach 1:
The patent replaces the mechanical vacuum force with acoustic energy. Ultrasonic cavitation creates internal micro-shocks within the treatment solution that separate gases without applying external pulling force to the thin permeation layer, thereby maintaining layer integrity while achieving degassing.
3Productivity
If degassing apparatus is disposed close to nozzle to maintain flow rate, then sufficient flow rate is achieved, but device size cannot be reduced
Solution Approach 1:
The patent merges the degassing function with the existing pump or nozzle structure by integrating the ultrasonic transducer directly into these components. This consolidation eliminates the need for a separate degassing apparatus positioned near the nozzle, reducing overall device size while maintaining sufficient flow rate through the integrated system.
Solution Approach 2:
The ultrasonic transducer serves multiple functions: it acts as both a degassing device and can be integrated with the pump or nozzle structure. This multi-functionality allows the same component to perform both fluid delivery and bubble removal, eliminating the need for additional dedicated degassing equipment.
4Productivity
If treatment solution passes through gas permeation layer for bubble removal, then bubbles are extracted, but separate drain pump is required
Solution Approach 1:
The patent extracts the gas bubbles from the treatment solution using ultrasonic cavitation applied directly to the liquid stream, allowing bubbles to be removed without requiring the solution to pass through a gas permeation layer. This eliminates the need for a separate drain pump system associated with the permeation layer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively removes dissolved gases from the treatment solution, reduces maintenance costs, and allows for a sufficient flow rate without the need for a separate degassing apparatus, leading to spatial and cost savings.
Implementation Method 1
the central flow path may include an introduction hole through which the chemical solution is introduced at one side and an ejection hole through which the chemical solution is ejected at the other side, and the ejection hole may have a cross-sectional area relatively smaller than a cross-sectional area of a pipe connected to the ejection hole so that the dissolved gas in the chemical solution is extracted in the form of the bubble through a cavitation phenomenon.
Data Source
AI summary
Provided is an equipment for treating a substrate. The substrate treating equipment may include: a nozzle supplying a chemical solution to a substrate; and a chemical solution supply apparatus supplying the chemical solution to the nozzle, and the chemical solution supply apparatus may include a pump member, an extraction nozzle provided on a flow path through which the chemical solution is introduced into the pump member and spraying the chemical solution by a spray scheme, and a control unit controlling an operation of the pump member.