Low-Porosity Ceramic Frame Member for Particle-Controlled E-Beam Lithography
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Solution Overview
Problem
Existing frame members for electron beam lithography devices generate particles and fail to adequately suppress electrostatic charge, particularly with high-density circuit patterns, necessitating further reduction in particle generation while maintaining electrostatic charge suppression.
Innovation Solution
A frame member composed of sapphire or aluminum oxide-based ceramics with open porosity of 0.2% or less, featuring a conductive film on the electron gun side, which reduces particle generation and electrostatic charge by enhancing mechanical strength, rigidity, and conductive performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If alumina sintered body with normal pressure sintering is used, then electrostatic charge suppression is achieved, but particle generation increases
Solution Approach 1:
The patent changes the physical parameter of open porosity from typical values (several percent) to an extremely low value of 0.2% or less through controlled sintering processes. This parameter change transforms the material properties to simultaneously achieve both electrostatic charge suppression and particle generation reduction, resolving the technical contradiction between these two harmful factors.
Solution Approach 2:
The frame member uses a composite structure combining sapphire or aluminum oxide-based ceramics with specific porosity characteristics. This composite material approach allows the framework to exhibit both electrical conductivity for charge suppression and structural integrity for particle reduction, addressing the contradiction between electrostatic charge suppression and particle generation.
2Object-generated harmful factors
If frame member density is increased to reduce particles, then particle generation decreases, but mechanical strength and rigidity may be compromised
Solution Approach 1:
The patent optimizes the open porosity parameter to 0.2% or less, which is sufficiently dense to reduce particle generation but maintained within a range that preserves mechanical strength. This precise parameter control resolves the contradiction between reducing particles through densification and maintaining adequate mechanical properties.
Solution Approach 2:
The sapphire or aluminum oxide-based ceramic material provides locally optimized properties where the crystalline structure and controlled porosity distribution create regions of high density for particle reduction while maintaining overall structural strength and rigidity required for frame functionality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces particle generation and maintains electrostatic charge suppression, improving the accuracy of electron beam drawing and extending the lifespan of the frame member.
Implementation Method 1
a conductive film disposed at least on a main surface of an electron gun side of the frame body
Implementation Method 2
a frame body composed of sapphire or aluminum oxide-based ceramics having an open porosity of 0.2% or less
Data Source
AI summary
A frame member for an electron beam lithography device of the present disclosure includes a frame body comprising sapphire or aluminum oxide-based ceramics having an open porosity of 0.2% or less and a conductive film disposed at least on a main surface of an electron gun side of the frame body.