Ceramic Implant Coating With Pulsed Sputtering for Smooth Surfaces
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Solution Overview
Problem
The application of hard, wear-resistant and oxidation-reducing multi-layer coatings on implants with concave geometries is challenging due to defects like pin holes and droplets, requiring extensive post-coat polishing to meet FDA standards.
Innovation Solution
A process using pulsed magnetron sputtering to deposit a ceramic multi-layer coating, which reduces defects and improves surface smoothness, wear resistance, and friction coefficient, thereby minimizing the need for extensive polishing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If cathodic arc deposition process is used to apply multi-layer coatings, then coating can be applied to implants, but coated surfaces have defects such as pin holes or droplets requiring extensive post polishing
Solution Approach 1:
The patent changes the deposition parameters by using pulsed magnetron sputtering instead of cathodic arc deposition. This process parameter change results in coatings with significantly reduced defects (pin holes and droplets) and eliminates the need for extensive post-polishing, directly resolving the contradiction between surface finish quality and manufacturing complexity
Solution Approach 2:
The patent replaces the mechanical post-polishing process with a optimized physical vapor deposition process (pulsed magnetron sputtering). By substituting the deposition method to inherently produce smoother surfaces, the need for subsequent mechanical polishing operations is eliminated, reducing manufacturing complexity while maintaining high surface finish quality
2Reliability
If extensive post coat polishing is performed to meet FDA standards, then coating defects are reduced, but processing time and complexity increase
Solution Approach 1:
The patent performs the surface quality optimization during the deposition process itself rather than as a subsequent step. By using pulsed magnetron sputtering with controlled parameters, the coating is deposited with inherently low defect levels, preliminarily achieving FDA compliance standards before the implant leaves the coating chamber, thus eliminating time-consuming post-polishing operations
3Manufacturing precision
If pulsed magnetron sputtering is used to deposit ceramic multi-layer coating, then surface smoothness and wear resistance are improved, but deposition process complexity increases
Solution Approach 1:
The patent uses pulsed magnetron sputtering with specific parameter settings (pulsed power, magnetron field configuration, deposition rate control) to achieve superior surface smoothness and wear resistance. While the deposition process is more complex than cathodic arc, the parameter optimization enables direct deposition of high-quality coatings without post-processing, making the overall manufacturing process more efficient
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process results in a smoother surface with reduced defects, enhanced wear resistance, and lower friction, extending the service life of implants with improved coating quality.
Implementation Method 1
pulsed magnetron sputtering, in particular pulsed DC magnetron sputtering and high-power pulse magnetron sputtering, utilize comparatively high cathode voltages to accelerate inert and/or reactive gas ions to a sputter target leading to the emission of target material (ions, atoms etc.)
Implementation Method 2
Both deposition techniques utilize commercially available physical vapor evaporation (PVD) coating systems
Data Source
Figure 1a~1b
Figure 2
AI summary
The invention relates to a process for coating an implant comprising the step of - depositing a ceramic multi-layer coating on a surface of the implant via pulsed magnetron sputtering. Further, the invention refers to an implant having a ceramic multi-layer coating.