Ceramic Nano-Membrane Filtration for Semiconductor Wastewater
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional semiconductor process wastewater treatment methods, such as chemical and biological treatments, face economic inefficiencies and high operating costs due to the need for chemical injections and are unsuitable for effectively removing ionic substances like ammonia nitrogen and fluorine from semiconductor wastewater.
Innovation Solution
A semiconductor process wastewater treatment system incorporating a membrane separation tank with a ceramic nano-membrane containing a carbon-based nano-material, such as graphene oxide, which filters nitrogen and fluorine components without requiring separate chemical injections or high operating costs, utilizing a Bardenpho process unit and clarifier for enhanced filtration efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If chemical treatment methods (calcium salt precipitation, struvite precipitation) are used, then ionic substances can be removed, but economic efficiency deteriorates due to high chemical costs
Solution Approach 1:
The patent extracts and removes harmful ionic substances (ammonia nitrogen, fluorine) from semiconductor wastewater through physical adsorption processes using activated carbon and bone char, eliminating the need for expensive chemical reagents while maintaining effective removal efficiency
Solution Approach 2:
The patent employs cost-effective, readily available adsorbent materials such as activated carbon and bone char that can be easily replaced or regenerated, replacing expensive chemical treatments with economical solid-phase adsorption media
2Manufacturing precision
If reverse osmosis (RO) process is used, then ammonia nitrogen and hydrofluoric acid can be removed, but operation cost deteriorates due to very high operating costs
Solution Approach 1:
The patent replaces the high-energy reverse osmosis mechanical separation system with low-energy physical adsorption processes using activated carbon and bone char, achieving comparable removal efficiency for ammonia nitrogen and hydrofluoric acid at significantly lower operational energy costs
Solution Approach 2:
The patent changes the treatment approach from high-pressure mechanical separation (RO) to ambient-condition physical adsorption, altering the operating parameters to reduce energy consumption while maintaining effective removal of target contaminants
3Adaptability or versatility
If biological treatment method (BNR process) is used, then treatment capability is provided, but effectiveness deteriorates due to low organic matter content in semiconductor wastewater
Solution Approach 1:
The patent introduces activated carbon and bone char as intermediary adsorbent materials that directly capture ammonia nitrogen and fluorine from wastewater, bypassing the need for biological processes that require organic matter as a foundation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively and economically removes ionic substances from semiconductor wastewater, improving filtration performance and reducing operational burdens by leveraging the nanofiltration capabilities of the ceramic nano-membrane, specifically targeting nitrogen and fluorine components.
Implementation Method 1
a membrane filtration unit having a ceramic nano-membrane, and filtering the effluent
Implementation Method 2
the ceramic nano-membrane includes a carbon-based nano-material
Data Source
AI summary
A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.


