Elliptical Ceramic Plasma Dome for In-Situ Chamber Cleaning
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Solution Overview
Problem
Existing substrate processing systems face inefficiencies in cleaning processing chambers due to the need for separate temperature settings for deposition and cleaning processes, leading to increased production time and particle contamination of showerheads.
Innovation Solution
An in-situ plasma-based cleaning process is implemented within each processing chamber, maintaining component temperatures within a narrow range (0-1%) of those used during substrate processing, using the same hardware for plasma generation, and employing a dome with a specific geometry and materials to optimize plasma movement and reduce contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate temperature settings are used for deposition and cleaning processes, then cleaning effectiveness is improved, but production time increases and temperature transitions are required
Solution Approach 1:
The patent changes the approach by not changing temperature parameters between deposition and cleaning processes. Instead, it uses plasma generation with the same hardware to achieve effective cleaning while maintaining temperatures within a narrow range (0-1% variation) of those used during substrate processing, thus eliminating time-consuming temperature transitions.
Solution Approach 2:
The processing chamber performs its own cleaning function using in-situ plasma generation with the same hardware components (coil, RF generator) used during substrate processing. This self-service approach eliminates the need for separate cleaning systems and temperature adjustments, reducing production time while maintaining cleaning effectiveness.
2Reliability
If separate temperature settings are used for cleaning, then cleaning efficacy is improved, but device complexity and operational complexity increase
Solution Approach 1:
The patent makes the plasma generation hardware (coil and RF generator) universal, serving both substrate processing and cleaning functions. By using the same hardware for both operations and maintaining similar temperature ranges, the system reduces operational complexity while achieving effective cleaning through plasma action rather than relying on temperature differentiation.
3Reliability
If traditional cleaning processes are used, then showerheads are cleaned, but particle contamination of showerheads occurs
Solution Approach 1:
The patent replaces traditional mechanical or thermal cleaning processes with plasma-based cleaning. The plasma, generated by the RF coil, chemically reacts with and removes contaminants from showerheads without generating particle contamination, thus improving cleaning reliability while eliminating the harmful effect of particle generation.
Solution Approach 2:
The plasma creates a controlled reaction environment that prevents particle contamination. The plasma chemistry selectively reacts with organic and inorganic contaminants on showerhead surfaces while leaving the showerhead material intact, effectively cleaning the components without generating harmful particles that would contaminate the chamber.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach eliminates the need for temperature transitions, reduces cleaning duration, enhances showerhead cleaning efficacy, and prevents particle contamination, thereby increasing production time and efficiency.
Implementation Method 1
The RF generator is configured to supply RF power to the coil to generate plasma in the dome during the substrate processing and the cleaning of the processing chamber
Implementation Method 2
The dome comprises a ceramic material... The controller is configured to control temperatures of the pedestal and the showerhead at respective predetermined temperatures within a predetermined range
Data Source
AI summary
A processing chamber includes a first portion, including a dome, and a second portion. The dome includes a ceramic material and is elliptical in shape. A pedestal to process a substrate is arranged in the second portion. A showerhead is arranged at a base of the dome between the first and second portions. An injector including the ceramic material is mounted on the dome to inject a process gas and a cleaning gas into the dome during substrate processing and cleaning of the processing chamber, respectively. A coil is disposed around a portion of the dome. An RF generator supplies RF power to the coil to generate plasma in the dome during the substrate processing and the cleaning. A controller controls temperatures of the pedestal and the showerhead at respective predetermined temperatures within a predetermined range during the substrate processing and the cleaning.