Ceramic Sleeve Injector Assembly for Plasma Gas Leakage Control

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Solution Overview

Problem

The existing plasma processing apparatuses face challenges with leakage and corrosion issues due to the deterioration of injector holders and gas injectors during prolonged use, leading to reduced operational life and increased costs.

Innovation Solution

A plasma processing apparatus design featuring a ceramic sleeve with a trapezoidal shape and O-ring sealing, which is more resistant to corrosion than the injector holder and gas injector, inhibiting leakage and extending the apparatus' operational life by providing a secure and durable interface.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional injector holder and gas injector are used, then the apparatus can operate initially, but leakage and corrosion occur during prolonged use reducing operational life

Engineering Contradiction:
Improveoperational lifeVSAvoidcorrosion and leakage
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A ceramic sleeve is introduced as an intermediary component between the injector holder and the gas injector. This sleeve acts as a mediator that directly contacts the plasma environment, protecting the metal components from corrosion while maintaining the functional interface for gas delivery. The ceramic material provides chemical inertness and corrosion resistance that the conventional metal components lack.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention employs a composite structure combining ceramic material (for the sleeve) with metal components (injector holder and gas injector). The ceramic sleeve provides corrosion resistance and chemical stability, while the metal components provide structural support and mechanical strength. This composite approach leverages the advantages of different materials to solve the contradiction between initial functionality and long-term reliability.

Inventive Principle:
Principle #40Composite materials

2Duration of action of stationary object

If the injector holder and gas injector are made more corrosion-resistant, then operational life extends, but device complexity and cost increase

Engineering Contradiction:
Improveoperational lifeVSAvoidstructure complexity
Core Design Contradiction:
Duration of action of stationary objectVSDevice complexity

Solution Approach 1:

The injector assembly is segmented into distinct functional components: the injector holder, the ceramic sleeve, and the gas injector. This segmentation allows each component to be optimized for its specific function - the ceramic sleeve for corrosion resistance and the metal components for structural integrity. The modular design also facilitates easier replacement and maintenance of individual components.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The ceramic sleeve is designed as a replaceable component that can be easily installed and removed. When corrosion or damage occurs, only the sleeve needs to be replaced rather than the entire injector assembly, reducing maintenance costs and downtime. This approach treats the corrosion-prone component as a consumable part that protects more expensive permanent components.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively reduces leakage and corrosion, thereby extending the operational life of the plasma processing apparatus and minimizing replacement costs by using a ceramic sleeve with O-ring sealing to secure the gas injector within the injector holder.

Implementation Method 1

A plasma processing apparatus design featuring a ceramic sleeve with a trapezoidal shape and O-ring sealing

Methodology Applied
Scientific EffectO-ring sealing: Mechanical Fastener

Data Source

PatentUS11923179B2Plasma processing apparatus and method
Publication Date: 2024.03.05 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11923179B2 patent drawing
  • US11923179B2 patent drawing
  • US11923179B2 patent drawing

AI summary

A plasma processing apparatus for semiconductor processing includes an injector holder configured to removably mate with a structure defining an interior chamber of a plasma processing apparatus. The injector holder defines a first opening. A sleeve is configured to be received within the first opening, and the sleeve defines a second opening. A gas injector is configured to be received within the second opening of the sleeve.