Ceramic Sputtering Target Microcrack Reduction
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Solution Overview
Problem
Current sputtering targets with ceramic materials face issues of microcracks and particle generation during machining, leading to substrate particles and nodules, which affect the quality of thin films formed in semiconductor devices, with existing methods insufficiently addressing microcrack suppression and particle reduction.
Innovation Solution
A ceramic sputtering target with a controlled amount of microcracks and peeling particles, achieved through surface grinding using a sponge polishing material and subsequent finishing with a vibration tool, to reduce microcrack frequency and depth, and peeling particle area ratio, resulting in a smoother sputtering surface with reduced nodules and improved target strength.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If surface grinding is performed on ceramic sintered body, then flat sputtering surface is obtained, but microcracks are generated on the surface
Solution Approach 1:
A slurry comprising ceramic particles and a liquid is introduced as an intermediary substance during the grinding process. The slurry serves as a mediator between the grinding tool and the ceramic sintered body, enabling effective material removal while significantly reducing microcrack generation on the sputtering surface
Solution Approach 2:
The invention changes the physical-chemical parameters of the grinding environment by introducing a specific slurry composition. The slurry's viscosity, particle size distribution, and chemical composition are optimized to reduce mechanical stress and thermal effects during grinding, thereby minimizing microcrack formation while maintaining surface flatness
2Strength
If microcracks are present on target surface, then target strength is reduced and particles are easily peeled off, but complete elimination of microcracks increases manufacturing complexity
Solution Approach 1:
The slurry is introduced during the grinding process as a preliminary protective measure. This preliminary action prevents microcrack formation before they can compromise target strength, eliminating the need for subsequent complex repair or reinforcement processes
Solution Approach 2:
The invention replaces purely mechanical grinding with a combined chemical-mechanical process using the slurry. The chemical components of the slurry soften or react with the ceramic surface, reducing the mechanical impact and microcrack generation during grinding, thereby maintaining target strength without increasing overall process complexity
3Object-generated harmful factors
If grinding powder adheres to target surface, then nodules are generated during sputtering, but removing grinding powder increases processing time
Solution Approach 1:
The slurry acts as an intermediary that prevents grinding powder adhesion in the first place. By maintaining the surface in a slurry-coated state during grinding, the grinding powder remains suspended and does not adhere to the target surface, eliminating the need for subsequent cleaning operations and reducing total processing time
Solution Approach 2:
The invention converts the potentially harmful effect of grinding powder adhesion into a beneficial outcome. The slurry transforms the grinding process into a self-cleaning operation where the liquid medium continuously flushes away particles, preventing nodule formation while actually reducing the need for separate cleaning steps
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The approach significantly reduces the generation of fine nodules and substrate particles during sputtering, ensuring stable sputtering performance and improved film quality by minimizing microcracks and peeling particles, while maintaining a suitable surface roughness for mechanical strength.
Implementation Method 1
there is a sputtering surface peeling particle area ratio of 1.0% or less in a case where a peel test is performed on the sputtering surface
Implementation Method 2
surface grinding using a sponge polishing material and subsequent finishing with a vibration tool
Data Source
AI summary
A ceramic sputtering target, wherein when a cross-sectional structure of a sputtering surface is observed with an electron microscope, an amount of microcracks defined below is 50 μm/mm or less, and after performing a peel test on the sputtering surface, an area ratio of peeled particles confirmed by observing the cross-sectional structure with an electron microscope is 1.0% or less.Amount of microcracks=frequency of microcracks×average depth of microcracks


