Chamber Cleaning Gas Ejection System for Display Manufacturing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing manufacturing processes for display apparatuses face challenges in uniformly cleaning the interior of the chamber, leading to incomplete removal of process gases, which can result in reduced deposition quality and efficiency due to foreign material contamination and non-uniform gas concentration.
Innovation Solution
The apparatus and method involve a chamber with a head unit that supplies process and cleaning gases, featuring a nozzle system with multiple ejection units to ensure uniform distribution of plasmarized cleaning gas through at least two paths, including a first ejection unit with an orifice and a second ejection unit with a diffuser plate, facilitating oblique gas supply and uniform concentration within the chamber, aided by a sensor unit for reaction detection and control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single cleaning gas supply path is used, then the device complexity is reduced, but the cleaning uniformity deteriorates
Solution Approach 1:
The cleaning gas supply system is divided into multiple independent ejection units (first cleaning gas ejection unit and second cleaning gas ejection unit) that喷射 cleaning gas to different regions of the chamber. This segmentation allows each unit to independently control gas flow to specific areas, achieving uniform cleaning across the entire chamber while maintaining manageable system complexity through modular design
Solution Approach 2:
Different ejection units are positioned to supply cleaning gas to different spatial locations within the chamber. The first ejection unit targets one region while the second ejection unit targets another region, ensuring that each local area receives optimized cleaning gas flow. This local quality approach resolves the contradiction by making the cleaning gas distribution spatially differentiated rather than uniform throughout
2Manufacturing precision
If cleaning gas is supplied to multiple portions of the storage space, then the cleaning uniformity is improved, but the device complexity increases
Solution Approach 1:
The storage space cleaning function is segmented into multiple ejection units, each responsible for a specific portion of the storage space. This segmentation improves cleaning uniformity by ensuring all areas are covered, while the modular nature of the segmented units keeps the overall device complexity manageable through standardized components
Solution Approach 2:
Multiple ejection units perform the same cleaning function but target different regions of the storage space. This multi-functionality approach allows the system to achieve comprehensive cleaning coverage without requiring fundamentally different mechanisms for each region, thus improving cleaning uniformity while controlling complexity through functional repetition rather than functional diversity
3Reliability
If the cleaning process is intensified to remove all process gas, then the cleaning performance is improved, but the cleaning time increases
Solution Approach 1:
The cleaning process is segmented into parallel operations where multiple ejection units simultaneously supply cleaning gas to different portions of the storage space. This parallelization intensifies the overall cleaning performance by covering all areas at once, rather than sequentially, thus improving cleaning effectiveness while reducing total cleaning time
Solution Approach 2:
The cleaning gas supply is maintained continuously and simultaneously across all ejection units throughout the cleaning process. This continuous multi-point action ensures that cleaning occurs uniformly across the entire storage space without interruption or sequential delays, achieving both high cleaning performance and efficient time utilization
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures improved cleaning performance, reduces cleaning time, minimizes gas usage, and effectively removes foreign materials, thereby enhancing the quality and efficiency of the deposition process and reducing defects in the display apparatus.
Implementation Method 1
a cleaning gas supply unit connected to the head unit and configured to plasmarize the cleaning gas and supply the cleaning gas that is plasmarized to the head unit
Data Source
AI summary
An apparatus for manufacturing a display apparatus includes: a chamber; a head unit configured to supply a process gas and a cleaning gas to an inside of the chamber; which has a storage space where the process gas or the cleaning gas is temporarily stored, and including a nozzle connected to the storage space and configured to guide the process gas or the cleaning gas from the storage space to the inside of the chamber; a susceptor unit arranged to face the head unit and on which a substrate is placeable; a cleaning gas supply unit connected to the head unit and configured to plasmarize the cleaning gas and supply the cleaning gas that is plasmarized to the head unit; and a cleaning gas ejection unit connected to the cleaning gas supply unit and configured to supply the cleaning gas to at least two portions of the storage space.