Chamber Impedance Detection for Particle Adsorption
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Solution Overview
Problem
Current substrate processing technologies cannot accurately detect the degree of particle adsorption on the inner walls of chambers, relying on visual inspection or photography which is inadequate for precise measurement.
Innovation Solution
A substrate processing apparatus and method that utilizes a detection unit with a diaphragm and voltage source to measure impedance changes, allowing for the accurate detection of particle adsorption by measuring capacitance changes and verifying with frequency vibration measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If visual inspection or camera photography is used to detect particles on the inner wall, then the detection method is simple, but the measurement precision is insufficient
Solution Approach 1:
The patent replaces the optical detection system (camera/visual inspection) with an electrical impedance measurement system. The diaphragm's impedance change caused by particle adsorption is measured electrically, providing quantitative data with higher precision while avoiding the limitations of optical methods.
Solution Approach 2:
The patent introduces a diaphragm as an intermediary element between the particle adsorption phenomenon and the detection system. The diaphragm converts the physical adsorption of particles into measurable impedance changes, enabling indirect but precise detection of particle coverage on chamber surfaces.
2Measurement precision
If a diaphragm-based impedance measurement system is used, then the measurement precision improves, but the device complexity increases
Solution Approach 1:
The diaphragm serves multiple functions: it acts as both the sensing element for particle detection and as part of the measurement circuit. The same diaphragm structure is used for both mechanical response to particle adsorption and electrical impedance measurement, reducing the need for separate complex sensing mechanisms.
3Measurement precision
If impedance change measurement is used to detect particle adsorption, then the detection accuracy improves, but the ease of operation decreases
Solution Approach 1:
The detection system automatically measures impedance changes and calculates particle adsorption levels without requiring manual intervention. The system self-calibrates and continuously monitors the diaphragm's impedance, providing automatic detection results that reduce operational complexity despite the sophisticated measurement principle.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise and convenient measurement of particle adsorption on chamber surfaces, informing maintenance cycles and ensuring optimal chamber conditions for substrate processing.
Implementation Method 1
Capacitance of the diaphragm may be changed by deposition of the particles, and the controller may measure the capacitance change of the diaphragm
Implementation Method 2
a plasma source that generates plasma from the gas supplied into the processing space
Data Source
AI summary
Disclosed is a substrate processing apparatus including a chamber having a processing space inside, a support unit that supports a substrate in the processing space, a gas supply unit that supplies gas into the processing space, a plasma source that generates plasma from the gas supplied into the processing space, and a detection unit that is provided in a sidewall of the chamber and that measures an impedance change to detect a degree of adsorption of particles on an inner wall of the chamber or a surface of a part that is exposed to the processing space.