Semiconductor Chamber Isolating Assembly Plasma Shielding
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Solution Overview
Problem
Conventional semiconductor processing chamber designs expose metal ring members to plasma, leading to damage and reduced part life, and existing cleaning methods are inefficient, causing material deposition accumulation and particle release.
Innovation Solution
A processing chamber design featuring a two-piece inner isolating member with radially aligned components and circumferential gaps to shield the metal ring member from plasma while allowing efficient cleaning gas access, utilizing a coaxially aligned isolating assembly with ceramic materials to isolate and protect chamber components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the metal ring member is exposed to plasma for processing, then the processing function is maintained, but the metal ring member suffers plasma damage and reduced part life
Solution Approach 1:
The isolating member is divided into two separate components: a inner isolating member and an outer isolating member. This segmentation allows the inner member to shield the metal ring from plasma while the outer member maintains processing functionality, resolving the contradiction between productivity and reliability
Solution Approach 2:
The isolating members act as intermediary components between the plasma environment and the metal ring member. These intermediaries protect the metal ring from direct plasma exposure while still allowing the processing chamber to function, thereby extending part life without sacrificing productivity
2Reliability
If the inner isolating member is solid to provide complete shielding, then plasma protection is maximized, but cleaning gas cannot access the metal ring member effectively
Solution Approach 1:
The inner isolating member features localized openings distributed around its circumference, creating regions of varying quality - solid sections provide plasma shielding while open sections allow cleaning gas access. This local quality variation resolves the contradiction between shielding effectiveness and cleaning efficiency
Solution Approach 2:
The inner isolating member incorporates a porous or perforated structure with multiple openings that allow cleaning gas to pass through while maintaining overall plasma shielding. This porous design enables both protection and accessibility, resolving the contradiction between reliability and productivity
3Device complexity
If conventional cleaning methods are used, then the process is simple, but material deposition accumulates and particles are released
Solution Approach 1:
The isolating member design enables continuous cleaning gas flow through the radial gap and across the metal ring member surface. This continuous action prevents material deposition accumulation and particle generation, improving manufacturing precision while maintaining reasonable process complexity
4Device complexity
If the isolating assembly uses a single-piece design, then the structure is simpler, but cleaning gas flow and plasma shielding are compromised
Solution Approach 1:
The isolating assembly is segmented into multiple components (inner isolating member, outer isolating member) that work together. This segmentation enables both effective plasma shielding and efficient cleaning gas flow, improving reliability while accepting increased structural complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively shields chamber components from plasma damage and significantly reduces cleaning time by ensuring thorough cleaning of the metal ring member and other isolating components, enhancing production throughput and device quality.
Implementation Method 1
expose metal ring members to plasma, leading to damage
Implementation Method 2
flow of a cleaning gas may be directed into a processing volume of the processing chamber
Data Source
AI summary
A processing chamber may include a gas distribution member, a metal ring member below the gas distribution member, and an isolating assembly coupled with the metal ring member and isolating the metal ring member from the gas distribution member. The isolating assembly may include an outer isolating member coupled with the metal ring member. The outer isolating member may at least in part define a chamber wall. The isolating assembly may further include an inner isolating member coupled with the outer isolating member. The inner isolating member may be disposed radially inward from the metal ring member about an central axis of the processing chamber. The inner isolating member may define a plurality of openings configured to provide fluid access into a radial gap between the metal ring member and the inner isolating member.