Dual Exhaust Line Switching for Wide-Range Chamber Pressure Control

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Solution Overview

Problem

Conventional substrate processing systems face difficulties in controlling pressure within a chamber to a high pressure due to limitations in valve design and pump operation, which restricts the pressure control range and affects the efficiency of processes like etching and cleaning.

Innovation Solution

The implementation of a substrate processing system with a dual exhaust line configuration, where a first exhaust line is used for low-pressure control and a second exhaust line with a smaller cross-sectional area is used for high-pressure control, allowing for precise pressure control between 10 mTorr and 100 Torr by utilizing turbomolecular and dry pumps with adaptive pressure controllers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a single exhaust line is used for pressure control, then the device structure is simple, but the pressure control range is limited and cannot achieve both low pressure (10 mTorr) and high pressure (100 Torr) effectively

Engineering Contradiction:
Improvepressure control rangeVSAvoidexhaust line configuration
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The exhaust system is divided into two separate exhaust lines: a first exhaust line with a first tube for low-pressure control and a second exhaust line with a second tube for high-pressure control. Each exhaust line has its own exhaust device and pressure controller, allowing independent optimization for different pressure ranges while expanding the overall pressure control capability from 10 mTorr to 100 Torr.

Inventive Principle:
Principle #1Segmentation

2Reliability

If a single exhaust device is used, then the device complexity is low, but the evacuation speed and pressure control precision are insufficient for both low and high pressure conditions

Engineering Contradiction:
Improvepressure control precisionVSAvoidexhaust device configuration
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

Different exhaust devices are assigned to different exhaust lines based on their specific pressure control requirements. The first exhaust device in the first tube is optimized for low-pressure evacuation with high speed, while the second exhaust device in the second tube is optimized for high-pressure control. Each exhaust device has its own pressure controller, ensuring precise pressure control tailored to each pressure range.

Inventive Principle:
Principle #3Local quality

3Productivity

If a large cross-section area tube is used for exhaust, then the evacuation capacity is high for low pressure, but the pressure control at high pressure becomes inefficient

Engineering Contradiction:
Improveevacuation speedVSAvoidhigh pressure control efficiency
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The exhaust system uses two separate tubes with different cross-sectional areas: a first tube with a larger cross-section for high-capacity low-pressure evacuation and a second tube with a smaller cross-section for precise high-pressure control. This segmentation allows each tube to be optimized for its specific pressure range, achieving both high evacuation speed at low pressure and high control efficiency at high pressure.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables efficient and accurate pressure control over a wide range, enhancing the throughput and precision of processes such as etching and cleaning by allowing seamless switching between low and high-pressure conditions.

Implementation Method 1

a first exhaust line includes a first tube connected to the chamber at one end, a first exhaust device disposed at a first position in the first tube... a second exhaust line includes a second tube connected to the chamber at one end... a second exhaust device connected to the other end of the second tube

Methodology Applied
Scientific EffectPressure gradient: Pressure Gradient

Implementation Method 2

by evacuating the chamber via the first exhaust line by the first exhaust device and the second exhaust device... by evacuating the chamber via the second exhaust line by the second exhaust device

Methodology Applied
Scientific EffectMechanical pumping: Pump

Data Source

PatentUS11742188B2Substrate processing method, pressure control apparatus and substrate processing system
Publication Date: 2023.08.29 TOKYO ELECTRON LTD
  • US11742188B2 patent drawing
  • US11742188B2 patent drawing
  • US11742188B2 patent drawing

AI summary

A substrate processing method is provided. In the method, a process gas is supplied into a chamber. A pressure in the chamber is controlled to a first pressure by evacuating the chamber via a first exhaust line. Then, the pressure in the chamber is controlled to a second pressure that is higher than the first pressure by evacuating the chamber via a second exhaust line while closing the first exhaust line. Next, the pressure in the chamber is controlled to the first pressure by evacuating the chamber via the first exhaust line while closing the second exhaust line.