Chamber Pressure Valve Sequencing for Fast Gas Discharge

Solution Overview

Problem

Existing semiconductor manufacturing processes face challenges in rapidly supplying and discharging high-pressure gas while minimizing the impact on the chamber and lines, leading to reduced apparatus lifespan.

Innovation Solution

A pressure adjustment apparatus with a storage tank, supply and discharge lines, and a controller that manages multiple valves to control gas flow, allowing sequential valve opening to minimize impact during gas discharge.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If gas is quickly supplied into the chamber for a faster process, then productivity is improved, but impact on the chamber and lines increases

Engineering Contradiction:

Improveprocess speedVSAvoidimpact on chamber and lines

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The discharge line is divided into multiple parallel paths with separate valves (first valve, second valve, third valve) to segment the gas discharge flow. This segmentation allows controlled distribution of gas flow, reducing sudden pressure surges and impact forces on the chamber and lines while maintaining fast discharge capability.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The third valve is opened in advance before the first and second valves are closed. This preliminary action creates a gradual transition in gas flow paths, preventing sudden pressure changes and reducing impact on the chamber and lines during the discharge process.

Inventive Principle:

Principle #10Preliminary action

2Productivity

If gas is discharged from the chamber quickly, then productivity is improved, but impact on the chamber and lines increases

Engineering Contradiction:

Improvedischarge speedVSAvoidimpact on chamber and lines

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The discharge line is divided into multiple parallel paths with separate valves (first valve, second valve, third valve) to segment the gas discharge flow. This segmentation allows controlled distribution of gas flow, reducing sudden pressure surges and impact forces on the chamber and lines while maintaining fast discharge capability.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The third valve is opened in advance before the first and second valves are closed. This preliminary action creates a gradual transition in gas flow paths, preventing sudden pressure changes and reducing impact on the chamber and lines during the discharge process.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 3:

The valve control system dynamically adjusts the discharge process by opening valves in a specific sequence (third valve first, then first and second valves, then closing first and second valves). This dynamic control optimizes discharge speed while minimizing impact forces on the chamber and lines.

Inventive Principle:

Principle #15Dynamics

3Measurement precision

If multiple valves are used to control gas flow, then pressure control precision is improved, but device complexity increases

Engineering Contradiction:

Improvepressure control precisionVSAvoidvalve control system

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The discharge line is divided into multiple parallel paths with separate valves (first valve, second valve, third valve) to segment the gas discharge flow. This segmentation allows controlled distribution of gas flow, reducing sudden pressure surges and impact forces on the chamber and lines while maintaining fast discharge capability.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The third valve is opened in advance before the first and second valves are closed. This preliminary action creates a gradual transition in gas flow paths, preventing sudden pressure changes and reducing impact on the chamber and lines during the discharge process.

Inventive Principle:

Principle #10Preliminary action

Data Source

PatentUS12518978B2Pressure adjustment apparatus for controlling pressure in chamber and substrate processing apparatus including the same

Publication Date: 2026.01.06 SYSTEM ENGINEERING MEGA SOLUTION CO LTD

AI summary

A pressure adjustment apparatus includes a storage tank storing a gas for the chamber with an outlet, a first supply line supplying the gas from an external line to the storage tank, a second supply line supplying the gas from the storage tank to the chamber, a discharge line discharging the gas from the chamber using the outlet of the chamber, and a controller controlling valves at the first, second, and discharge lines. The discharge line includes first and second valves connected to each other in parallel at an end portion of the outlet of the chamber, and a third valve connected to the end portion of the outlet of the chamber. The controller opens the first and second valves to discharge the gas from the chamber, and opens the third valve after a predetermined amount of time after the opening of the first and second valves.