Process Chamber Reflector Geometry for Uniform Epitaxial Heating
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Solution Overview
Problem
Existing semiconductor processing technologies face challenges in achieving uniform temperature and thickness of deposited films across substrates due to temperature non-uniformity, particularly at the edge regions, despite precise heating control.
Innovation Solution
The implementation of an inner reflector with optimized distances and reflective surfaces, combined with a light guide assembly and support kits, to enhance radiant energy reflection and uniform heating of substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a reflector is placed close to the substrate to improve heating uniformity, then film thickness uniformity is improved, but the reflector may block radiant energy from reaching the substrate
Solution Approach 1:
The reflector employs a curved surface geometry (concave or convex) rather than a flat surface. This curvature allows the reflector to redirect radiant energy in a manner that improves heating uniformity across the substrate without blocking the direct path of radiation from the heating element to the substrate, thus resolving the contradiction between improving film thickness uniformity and maintaining energy distribution.
2Power
If the reflector is positioned to maximize radiant energy reflection, then heating efficiency is improved, but temperature non-uniformity may increase causing edge roll-off
Solution Approach 1:
The reflector design incorporates varying surface properties or geometries at different locations to achieve localized control over radiant energy reflection. This allows different regions of the substrate to receive appropriately distributed energy, improving overall temperature uniformity while maintaining high heating efficiency, thereby preventing edge roll-off phenomenon.
3Manufacturing precision
If the vertical distance between the reflector and heating elements is reduced to improve energy distribution, then film thickness uniformity improves, but the reflector structure becomes more complex
Solution Approach 1:
The reflector structure is divided into multiple segments or zones, each with specific geometric characteristics. This segmentation allows the complex overall function to be achieved through simpler, modular components that can be manufactured and assembled more easily, reducing overall device complexity while maintaining improved energy distribution and film thickness uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves temperature uniformity and film thickness consistency across the substrate, minimizing the edge roll-off phenomenon and enhancing deposition quality.
Implementation Method 1
a plurality of heating elements disposed around the reflector, each heating element being operable to emit energy radiation
Implementation Method 2
the reflector does not block or reflect radiant energy
Data Source
AI summary
A substrate processing chamber for performing an epitaxial deposition process is provided. The chamber includes a substrate support having an upper surface, a reflector disposed above the substrate support. The reflector includes a body comprising an upper opening having a first diameter, a bottom opening having a second diameter less than the first diameter, and a flange protruding radially from an outer circumference of the body around the upper opening, wherein the flange comprises a plurality of holes. The chamber includes a plurality of heating elements disposed around the reflector, each heating element being operable to emit energy radiation, a plurality of support kits, each support kit comprising a bar member and a fastener removably coupled to the bar member, wherein the bar member and fastener are configured to secure to the respective hole in the flange so that the reflector is at a height that reduces blockage of the energy radiation and increases an amount of the energy radiation to be distributed across the upper surface of the substrate support. The chamber further includes a cooling plate coupled to the flange by the plurality of support kits, wherein the cooling plate comprises an opening sized to allow passage of the body of the reflector.