Semiconductor Chamber Sticking Probability Control

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Solution Overview

Problem

The temperature of the chamber wall in semiconductor manufacturing devices does not accurately represent the sticking probability of particles, leading to unstable etching rates despite maintaining a predetermined temperature.

Innovation Solution

A semiconductor manufacturing device with a sensor to detect an index value indicating the chamber state, a sticking probability calculator, and a control section to adjust the sticking probability by varying parameters such as light irradiation, gas supply, or voltage application, ensuring the sticking probability is maintained at a predetermined value.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If the temperature of the chamber wall is maintained at a predetermined temperature by feedback control, then the temperature stability is improved, but the etching rate cannot necessarily be maintained at a desired rate because the temperature does not accurately represent the sticking probability of particles

Engineering Contradiction:
Improvechamber wall temperatureVSAvoidetching rate
Core Design Contradiction:
TemperatureVSManufacturing precision

Solution Approach 1:

The invention transitions from controlling only temperature to controlling multiple parameters including sticking probability. The control section adjusts the sticking probability as an additional control parameter alongside temperature, recognizing that etching rate depends on both temperature and particle sticking characteristics. This multi-parameter control approach resolves the contradiction by adding degrees of freedom to the control system.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention implements a feedback control mechanism where the actual etching rate is measured and compared with the target etching rate. Based on this feedback, the control section adjusts the sticking probability to compensate for deviations in etching rate, even when temperature is held constant. This closed-loop feedback ensures that the etching rate is maintained at the desired level.

Inventive Principle:
Principle #23Feedback

2Quantity of substance

If particles are deposited on the chamber wall changing its heat capacity, then the chamber wall state changes, but the temperature measurement becomes an inaccurate indicator of particle sticking probability

Engineering Contradiction:
Improveparticle deposition amountVSAvoidsticking probability measurement
Core Design Contradiction:
Quantity of substanceVSMeasurement precision

Solution Approach 1:

The invention introduces sticking probability as an intermediary parameter that directly reflects the state of particle deposition on the chamber wall. Instead of using temperature as a direct measure of sticking probability, the system uses sticking probability as an intermediate variable that is controlled to achieve the desired etching rate, decoupling the measurement accuracy from the physical changes in chamber wall heat capacity.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Stability of the object's composition

If the sticking probability is controlled by adjusting multiple parameters such as light irradiation, gas supply, or voltage application, then the etching rate stability is improved, but the device complexity increases

Engineering Contradiction:
Improveetching rate stabilityVSAvoidcontrol system complexity
Core Design Contradiction:
Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The control section is designed as a multi-functional unit that can adjust multiple parameters (light irradiation amount, gas supply amount, voltage application amount) to control the sticking probability. This universal control approach allows a single control system to manage various aspects of the chamber environment, achieving etching rate stability without proportionally increasing overall system complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for precise control of the sticking probability, stabilizing the etching rate and improving the quality of semiconductor devices by effectively managing the chamber wall conditions.

Implementation Method 1

an index value calculating section configured to calculate the index value on a basis of the calculated particle density... the sensor detects the emission intensity in the direction of the line of sight

Methodology Applied
Scientific EffectLight emission: Luminescence

Implementation Method 2

a sticking probability calculating section configured to calculate a value of a sticking probability of particles sticking to a chamber wall of the chamber... an acting section capable of varying the sticking probability in the chamber

Methodology Applied
Scientific EffectSticking probability: Adsorption

Data Source

PatentUS8649893B2Semiconductor manufacturing device, semiconductor device manufacturing method, simulation device, and simulation program
Publication Date: 2014.02.11 SONY GROUP CORP
  • US8649893B2 patent drawing
  • US8649893B2 patent drawing
  • US8649893B2 patent drawing

AI summary

Disclosed herein is a semiconductor manufacturing device including, a chamber, a sensor, a sticking probability calculating section, an acting section, and a control section.