Chamber Body Trench Layout for Phase-Matched RF Transmission
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Solution Overview
Problem
Existing semiconductor wafer processing systems face challenges in designing RF power transmission solutions that account for serviceability, organization, safety, and electrical phase matching for complex power-consuming loads in process chambers.
Innovation Solution
A semiconductor wafer processing system with a chamber body featuring a trench through which transmission lines pass, allowing for even distribution of RF power to multiple process chambers while maintaining safety and electrical phase matching, and facilitating easy access for servicing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If transmission lines are routed externally or without a structured trench, then installation and servicing may be simpler, but organization, safety, and electrical phase matching deteriorate
Solution Approach 1:
The trench structure is segmented into multiple channels (ingress, delivery, egress) that separately guide different transmission lines. This segmentation organizes the RF power transmission paths, preventing signal interference while maintaining a systematic layout that balances installation feasibility with organizational requirements.
Solution Approach 2:
The patent transitions from two-dimensional surface routing to three-dimensional subsurface routing by excavating a trench within the chamber body. This dimensional change allows transmission lines to be embedded within the structure, improving organization and safety while maintaining accessible service points at the surface level.
2Area of stationary object
If transmission lines are bundled closely together, then space is saved, but crosstalk and electrical interference increase
Solution Approach 1:
The trench is divided into multiple independent delivery channels, each accommodating specific transmission lines. This segmentation physically separates the lines while keeping them within the same trench structure, achieving both compact space utilization and minimal crosstalk through controlled isolation.
Solution Approach 2:
The trench walls and channel structures act as intermediary barriers between transmission lines. These physical barriers provide electrical isolation and shielding, preventing harmful electromagnetic coupling while maintaining close proximity for efficient space utilization.
3Reliability
If transmission lines are routed through a complex trench structure, then organization and phase matching improve, but manufacturing complexity increases
Solution Approach 1:
The trench structure serves multiple functions simultaneously: it provides mechanical support for transmission lines, electrical isolation through channel segmentation, phase matching through controlled path lengths, and thermal management. This multi-functionality reduces the need for additional separate components, offsetting the manufacturing complexity with consolidated design benefits.
Solution Approach 2:
The trench design ensures that transmission lines follow paths of equal electrical length from the power source to each process chamber. This equipotential approach to path design guarantees consistent phase matching across all chambers, improving reliability while the standardized trench geometry facilitates manufacturability.
4Ease of repair
If transmission lines are exposed and easily accessible, then servicing is easier, but safety and organization deteriorate
Solution Approach 1:
The transmission lines are nested within the trench structure, which is itself part of the chamber body. This nested arrangement protects the lines from external damage and improves safety, while service access points are provided at the trench openings, allowing maintenance personnel to reach the lines without exposing the entire routing path.
Solution Approach 2:
The transmission lines are extracted from the general chamber space and placed into the dedicated trench structure. This extraction isolates the lines from other chamber components, improving safety and organization, while the trench design includes access channels that allow selective extraction of individual lines for servicing without disturbing the entire system.
Data Source
AI summary
A wafer processing system is provided. In one aspect, the wafer processing system includes a chamber body arranged to support a plurality of process chambers. The chamber body defines at least a portion of a trench formed within the chamber body. The wafer processing system also includes transmission lines disposed within the trench to electrically couple an output of a power supply with respective ones of a plurality of antennas disposed within respective ones of the plurality of process chambers.


