Processing Chamber Zone Grouping for Uniform Epitaxial Deposition

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Solution Overview

Problem

Semiconductor substrate processing operations face challenges with deposition non-uniformity and limited process adjustability, particularly in batch epitaxial processing, which are exacerbated by complex processing operations and inefficient hardware configurations.

Innovation Solution

The processing chamber is partitioned into zones along multiple directions, with gas lines connected to grouped subsets of these zones, and a flow guide structure divides the volume to facilitate uniform gas distribution and adjustability, using a system with main lines and flow ratio controllers to manage reactive gases and carrier gases.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If batch epitaxial processing is used, then throughput is improved, but deposition uniformity deteriorates

Engineering Contradiction:
ImprovethroughputVSAvoiddeposition uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The processing chamber is divided into multiple independently controllable zones along different directions. Each zone has its own gas delivery system with separate mass flow controllers, allowing independent adjustment of process parameters to achieve uniform deposition across all substrates processed in batch mode.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different zones within the processing chamber are equipped with independently controllable gas delivery systems, enabling local adjustment of process conditions. This allows each zone to be optimized for its specific position and substrate requirements, ensuring uniform deposition across the entire batch while maintaining high throughput.

Inventive Principle:
Principle #3Local quality

2Adaptability or versatility

If complex processing operations are implemented, then process adjustability is improved, but hardware complexity increases

Engineering Contradiction:
Improveprocess adjustabilityVSAvoidhardware complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The gas delivery system is segmented into multiple independent control channels, each with its own mass flow controller and gas lines. This modular architecture enables complex processing operations and high process adjustability while keeping each individual control unit relatively simple and manageable.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The zoned gas delivery system provides a universal platform that can support multiple different processing operations and parameters. The same hardware infrastructure enables various epitaxial processing modes by simply adjusting the flow rates and conditions in different zones, without requiring additional complex hardware for each operation type.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Ease of operation

If more gas lines are connected to each zone, then process control is improved, but device complexity increases

Engineering Contradiction:
Improveprocess controlVSAvoiddevice complexity
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

Instead of connecting multiple gas lines to each individual zone, the system segments the control at the source by providing each zone with its own dedicated mass flow controller and gas delivery path. This approach improves process control for each zone while avoiding the complexity of multiple interconnected gas line systems.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent combines multiple gas delivery functions into integrated zone control units, where each zone has a consolidated gas delivery system with its own mass flow controller. This merging of functions within each zone reduces the overall complexity compared to having separate gas lines for each parameter adjustment.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS20260043142A1Methods of correlating zones of processing chambers, and related systems and methods
Publication Date: 2026.02.12 APPLIED MATERIALS INC
  • US20260043142A1 patent drawing
  • US20260043142A1 patent drawing
  • US20260043142A1 patent drawing

AI summary

The present disclosure relates to methods of correlating zones of processing chambers, and related systems and methods. In one implementation, a method of correlating zones of a processing chamber includes partitioning the processing volume into a plurality of zones along a first direction of the processing volume and a second direction of the processing volume. The second direction intersects the first direction. The plurality of zones have a first zone number (m), and a second zone number (n). The method includes determining a group number. The determining of the group number includes multiplying a first value by a second value. The first value correlates to a first zone number (m) of a plurality of zones and the second value correlates to a second zone number (n) of the plurality of zones. The method includes grouping the zones into groups having a number that is equal to the group number.