Chamfer Measurement Accuracy via Extended Path and Compensating Element

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Solution Overview

Problem

Measuring chamfer properties, especially in small dimensions, is challenging due to limited measurement points and positional tolerance issues, making accurate determination difficult.

Innovation Solution

A method involving the generation of measurement points along a measuring path over a chamfer edge, followed by determining a compensating element that minimizes deviation from these points to accurately determine the chamfer's spatial position, using optimization methods like least squares to ensure reliable and easy implementation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If measurement points are generated along the surface of a small chamfer, then measurement data is obtained, but the number of measurement points is insufficient leading to poor measurement accuracy

Engineering Contradiction:
Improvechamfer measurement accuracyVSAvoidnumber of measurement points
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The patent transitions from measuring only on the chamfer surface to measuring on an extended measuring path that includes adjacent surfaces. This dimensional extension allows generation of sufficient measurement points while maintaining relevance to chamfer geometry, resolving the contradiction between measurement accuracy and quantity of measurement points.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent performs preliminary determination of chamfer edge spatial position using an unadapted compensating element before final chamfer property determination. This preliminary action creates a reference framework that enables accurate measurement even with limited measurement points on the actual chamfer surface.

Inventive Principle:
Principle #10Preliminary action

2Area of stationary object

If positional tolerance of chamfer edge is greater than chamfer width, then measurement coverage is improved, but measurement accuracy deteriorates

Engineering Contradiction:
Improvemeasurement coverage areaVSAvoidchamfer position accuracy
Core Design Contradiction:
Area of stationary objectVSMeasurement precision

Solution Approach 1:

The patent introduces an unadapted compensating element as an intermediary between the measurement points and the chamfer edge position determination. This compensating element serves as a mediator that connects the extended measuring path data to the actual chamfer geometry, enabling accurate position determination despite large positional tolerance relative to chamfer width.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If a compensating element is determined to minimize deviation from measurement points, then measurement accuracy is improved, but computational complexity increases

Engineering Contradiction:
Improvechamfer property determination accuracyVSAvoidevaluation algorithm complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent determines an unadapted compensating element that minimizes deviation from measurement points, applying optimization methods selectively to the essential parameters. This partial optimization approach achieves sufficient measurement accuracy without requiring exhaustive computational analysis of all possible parameters, balancing accuracy with computational feasibility.

Inventive Principle:
Principle #16Partial or excessive action

Data Source

PatentUS11713965B2Method and apparatus for determining a chamfer property of a workpiece chamfer and computer program
Publication Date: 2023.08.01 CARL ZEISS INDUSTRIELLE MESSTECHNIKE GMBH
  • US11713965B2 patent drawing
  • US11713965B2 patent drawing
  • US11713965B2 patent drawing

AI summary

An apparatus, a method, and a computer program for determining a chamfer property of a workpiece chamfer are provided. The method includes generating measurement points along at least a first measuring path, the first measuring path running over a first chamfer edge, determining at least one unadapted compensating element for the measurement points of the first measuring path, and determining a spatial position of the first chamfer edge depending on a deviation between the measurement points of the first measuring path and the at least one unadapted compensating element.