Chamfered Intervertebral Spacer Reduces Diagonal Distance
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Solution Overview
Problem
Current spinal implants used in PLIF and TLIF procedures often cause over-distraction of the disc space and risk scraping of vertebral endplates during rotation due to their diagonal distance being greater than the implant's height, leading to potential complications during insertion and final orientation.
Innovation Solution
A spinal implant with chamfered edges and a specially designed insertion tool that allows for sideways insertion and 90-degree rotation within the disc space, minimizing distraction and preventing endplate scraping by reducing the diagonal distance between chamfered edges, thereby facilitating a smoother rotation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the implant is inserted sideways and rotated in situ to perform PLIF or TLIF procedures, then the implant can be positioned between target vertebrae, but the diagonal distance between opposing corners of the implant is significantly greater than the height of the implant, resulting in over-distraction of the disc space
Solution Approach 1:
The implant features asymmetric geometry with chamfered edges that create a shorter diagonal path during rotation. The chamfered edges are positioned to reduce the effective diagonal distance traversed during in-situ rotation, allowing the implant to achieve proper orientation while minimizing disc space distraction.
Solution Approach 2:
The chamfered edges modify the implant's dimensional profile by creating beveled surfaces that reduce the diagonal extent of the implant body. This dimensional modification allows the implant to rotate through a smaller angular path without excessive distraction of the disc space.
2Ease of operation
If the implant is rotated in situ from insertion position to final orientation, then the implant achieves proper positioning, but the potential for scraping the endplates of either or both of the target vertebrae during the rotation process increases
Solution Approach 1:
The chamfered edges serve as protective features that prevent the implant corners from contacting and scraping the vertebral endplates during rotation. By providing a chamfered transition instead of a sharp corner, the implant design cushions against potential endplate damage during the rotation process.
3Ease of manufacture
If the implant has a standard rectangular geometry without chamfered edges, then manufacturing is simpler, but the diagonal distance between opposing corners is significantly greater than the height of the implant
Solution Approach 1:
The chamfered edges create an asymmetric geometry that reduces the diagonal distance of the implant. While this adds a manufacturing step compared to a simple rectangular form, the chamfering process is a standard machining operation that maintains reasonable manufacturing complexity while achieving the desired geometric modification.
Data Source
AI summary
Intervertebral implants, assemblies, and methods thereof. An intervertebral implant includes opposing chamfered edges to reduce a diagonal distance between the edges. The reduced diagonal distance minimizes distraction of an intervertebral disc space during insertion of the implant. A tool for insertion and rotation of the implant is also provided.