Charged Particle Beam Device ABCC Control

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Solution Overview

Problem

Charged particle beam devices face a trade-off between throughput and robustness in adjusting brightness and contrast of captured images, with existing methods either sacrificing efficiency for robustness or vice versa due to varying pattern densities and defect states on sample surfaces.

Innovation Solution

A charged particle beam device that determines the necessity of auto brightness and contrast control (ABCC) for each imaging target based on initial image evaluation, adjusting settings only when necessary to balance throughput and robustness by updating BC values for optimal image capture.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If ABCC is performed on all imaging targets each time, then robustness is ensured to cope with various pattern densities, but processing time increases and throughput decreases

Engineering Contradiction:
ImproverobustnessVSAvoidthroughput
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent applies partial action by performing ABCC only on a first imaging target and selectively applying its BC values to subsequent imaging targets based on pattern density comparison, rather than performing ABCC on all imaging targets. This reduces the number of ABCC operations while maintaining adequate image quality for most targets.

Inventive Principle:
Principle #16Partial or excessive action

Solution Approach 2:

The patent changes the parameter application strategy by calculating BC values from a first imaging target and reusing these parameter values for subsequent imaging targets with similar pattern densities, thereby avoiding repeated ABCC operations and improving throughput while maintaining robustness.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If ABCC is performed only on the first imaging target and BC values are applied to subsequent targets, then throughput increases, but robustness decreases due to inability to adapt to different pattern densities

Engineering Contradiction:
ImprovethroughputVSAvoidrobustness
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent applies local quality by comparing the pattern density of each subsequent imaging target with the first imaging target and selectively applying the BC values only when densities are similar. This ensures local adaptation to pattern density variations while maintaining high throughput.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent implements feedback by evaluating whether the pattern density of subsequent imaging targets matches the first imaging target before applying BC values. This feedback mechanism ensures that parameter reuse is appropriate and maintains image quality across varying conditions.

Inventive Principle:
Principle #23Feedback

3Manufacturing precision

If ABCC is performed on each imaging target, then saturation is avoided and image quality is maintained, but processing time is consumed reducing overall efficiency

Engineering Contradiction:
Improveimage qualityVSAvoidprocessing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent performs ABCC only partially on the first imaging target to establish baseline BC values, then reuses these values for subsequent targets with similar pattern densities. This partial application of ABCC reduces processing time while maintaining adequate image quality through selective parameter reuse.

Inventive Principle:
Principle #16Partial or excessive action

Solution Approach 2:

The patent performs preliminary ABCC on the first imaging target to calculate BC values that can be reused for subsequent targets with similar pattern densities. This preliminary action establishes parameter values in advance, avoiding repeated ABCC operations and reducing overall processing time.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS11501950B2Charged particle beam device
Publication Date: 2022.11.15 HITACHI HIGH TECH CORP
  • US11501950B2 patent drawing
  • US11501950B2 patent drawing
  • US11501950B2 patent drawing

AI summary

Provided is a technique capable of achieving both throughput and robustness for a function of adjusting brightness (B) and contrast (C) of a captured image in a charged particle beam device. The charged particle beam device includes a computer system having a function (ABCC function) of adjusting the B and the C of an image obtained by imaging a sample. The computer system determines whether adjustment is necessary based on a result obtained by evaluating a first image obtained by imaging an imaging target of the sample (step S2), executes, when the adjustment is necessary based on a result of the determination, the adjustment on a second image of the imaging target to set an adjusted B value and an adjusted C value (step S4), and captures a third image of the imaging target based on the adjusted setting values to generate an image for observation (step S5).