Charged Particle Beam Examination for Aberration Correction
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Solution Overview
Problem
Particle-optical systems face challenges in determining and improving the quality of charged particle beams due to aberrations and beam disturbances, which affect resolution and positional accuracy.
Innovation Solution
A method involving the production of persistent interactions with a sample at multiple positions to analyze the spatial distribution of these interactions, using mathematical models like Zernike polynomials, to derive beam properties such as aberrations and distortions, allowing for targeted correction of beam optical units.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If particle-optical systems are used to achieve high resolution and sub-nanometer structure examination, then spatial resolution is improved, but beam quality deteriorates due to aberrations and beam disturbances
Solution Approach 1:
The patent applies preliminary action by performing beam examination and aberration analysis before the actual high-resolution imaging or manipulation tasks. The method examines the beam at multiple positions upstream of the sample, derives beam properties including aberrations, and enables targeted correction measures to be taken beforehand, ensuring optimal beam quality for subsequent high-resolution work.
Solution Approach 2:
The patent implements feedback by creating a closed-loop system where the beam is examined, aberrations are detected and analyzed, and correction measures are applied. The examination apparatus provides information about beam quality that feeds back to the particle-optical system operators, enabling them to adjust and correct aberrations to maintain optimal beam quality for high-resolution imaging.
2Measurement precision
If beam examination methods are implemented to improve beam quality, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The patent applies universality by designing an examination apparatus that can perform multiple functions: examining beam properties at multiple positions, deriving various aberrations (astigmatism, spherical aberration, chromatic aberration), and providing comprehensive beam quality assessment. This multi-functional approach consolidates what would otherwise require multiple separate measurement devices into a single integrated system.
Solution Approach 2:
The patent uses an intermediary approach by introducing a dedicated examination apparatus that acts as a mediator between the particle-optical system and the analysis/correction processes. This separate examination device intercepts the beam at multiple positions without disrupting the main imaging path, enabling comprehensive beam characterization while keeping the primary system architecture intact.
3Measurement precision
If multiple beam positions are examined to derive comprehensive beam properties, then measurement precision is improved, but loss of time increases
Solution Approach 1:
The patent applies preliminary action by performing all necessary beam examinations at multiple positions before the actual imaging or manipulation tasks. By completing the comprehensive beam characterization upfront, the system avoids repeated measurements during operation, thereby minimizing time loss while ensuring accurate beam property derivation for subsequent high-resolution work.
Data Source
AI summary
The present invention relates to a method for examining a beam of charged particles, including the following steps: producing persistent interactions of the beam with a sample at a plurality of positions of the sample relative to the beam and deriving at least one property of the beam by analyzing the spatial distribution of the persistent interactions at the plurality of positions.