Charged Particle Beam Defect Identification
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods struggle to accurately determine the material elements of nanometric foreign particles on wafer substrates due to ambiguities in electromagnetic emission spectra, where energy differences between peaks are below the resolution of spectroscopy processes, leading to unclear identification of defect materials.
Innovation Solution
A method utilizing a charged particle beam system that combines spectroscopy to acquire electromagnetic emission spectra and backscattered electron (BSE) imaging to resolve ambiguities by analyzing intensity differences and classifying defect material elements based on their atomic weight classes, with the aid of background material information.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If spectroscopy process is used to determine defect material elements, then material identification is achieved, but ambiguity exists when energy differences between peaks are below resolution
Solution Approach 1:
The patent combines spectroscopy data with backscattered electron (BSE) image information to resolve spectral ambiguities. By merging the chemical composition data from spectroscopy with the atomic number contrast data from BSE imaging, the system can distinguish between material elements that have overlapping spectral peaks, thereby eliminating information loss and improving identification accuracy.
2Measurement precision
If BSE image is acquired to resolve spectral ambiguity, then defect material element is identified, but additional measurement time is required
Solution Approach 1:
The system performs preliminary analysis of the spectral data to determine whether ambiguity exists before acquiring BSE images. Only when spectral peaks are detected to be below the resolution threshold does the system proceed to acquire BSE images for disambiguation. This preliminary screening action reduces unnecessary BSE image acquisitions and minimizes additional measurement time while maintaining accurate identification.
3Measurement precision
If high resolution spectroscopy is applied to distinguish material elements, then identification accuracy improves, but measurement complexity increases
Solution Approach 1:
Instead of always using high-resolution spectroscopy, the system applies a partial action approach: it first uses standard-resolution spectroscopy to identify most defects, and only invokes high-resolution or complementary BSE imaging when spectral peaks indicate potential ambiguities. This selective application of enhanced measurement capabilities achieves accurate material differentiation while avoiding the constant complexity overhead of high-resolution systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively distinguishes between potential material elements, providing clear classification of defect material elements, even when energy differences are below the spectroscopy resolution, thereby improving the accuracy of defect identification on wafer substrates.
Implementation Method 1
acquiring, by a charged particle beam system and by applying a spectroscopy process, an electromagnetic emission spectrum of a part of a defect
Implementation Method 2
acquiring, by the charged particle beam system, a backscattered electron (BSE) image of an area that may include the defect
Data Source
AI summary
A method for determining a defect material element, the method includes (a) acquiring, by a charged particle beam system and by applying a spectroscopy process, an electromagnetic emission spectrum of a part of a defect; (b) acquiring, by the charged particle beam system, a backscattered electron (BSE) image of an area that includes the defect; and (c) determining a defect material element. The determining of the defect material element includes: determining whether an ambiguity exists in the electromagnetic emission spectrum, and resolving the ambiguity based on the BSE image, when it is determined that the ambiguity exists.