Charged Particle Beam Drawing Apparatus Proximity Effect Correction

The patent changes the area parameter of representative figures in the proximity effect correcting map to adjust the calculated proximity effect correction doses. By modifying the area of representative figures (enlarging or reducing them), the system can locally adjust correction doses for specific patterns without changing the physical apparatus structure, thus improving pattern accuracy through parameter modification rather than hardware complexity

The patent uses representative figures as simplified copies or models of actual patterns in each mesh. Instead of directly measuring and correcting each individual pattern, the system creates representative figures that capture the essential area characteristics, calculates correction doses based on these representatives, and applies the corrections efficiently. This copying approach reduces computational complexity while maintaining correction accuracy

The patent performs preliminary calculation of proximity effect correction doses using the original figure areas before making any modifications. The system first calculates the doses based on initial representative figure areas, then determines the necessary dose adjustments, and only afterward modifies the representative figure areas to reflect the corrected doses. This preliminary action ensures that the original area information is preserved in the calculation process while still enabling effective localized correction

The patent introduces the proximity effect correcting map with representative figures as an intermediary between the original drawing data and the final pattern drawing process. The representative figures serve as a mediating layer that can be modified for correction purposes without permanently altering the original design data. The system can revert to or reference the original figure areas when needed, using the intermediary map for actual correction operations